Used VARIAN M 2000 #9404417 for sale

VARIAN M 2000 is a sputtering equipment designed to deposit thin films of high-quality materials on substrates. It is widely used in the semiconductor industry, where thin films are used to create electrical components, as well as in the medical industry, where thin films are used to create medical implants, microelectrodes and other biomedical components. VARIAN M2 000 is a versatile, high-yielding sputtering system. It features two cathodes, two throat bells, two deposition chambers, one sputter chamber, a directional water curtain, and its own integrated process control. It can deposit thin films of a variety of materials, including oxides, nitrides, metal-oxide, metal-nitride, and metallic films. It can also handle a range of substrates, such as silica, silicon, nickel and titanium substrates. M 2000 is easy to use and maintain. It runs on an advanced process control unit, including an integrated custom process controller, an interactive graphical user interface, ease-of-use safety features, and comprehensive process monitoring. The process controller can be configured for a variety of depositing conditions, with customizable deposition recipes. It also features an advanced features manager, which makes it easy to customize and optimize sputtering processes. The interactive graphical user interface simplifies set-up, even for inexperienced users. M2 000 produces thin films of the highest quality. This makes it an ideal choice for applications requiring either high-yield or high-grade thin films. Its process monitoring capabilities and ease-of-use make it perfect for both small productions and large-scale manufacturing. It is also capable of simultaneously depositing multiple layers, enabling it to achieve rapid deposition rates without sacrificing film quality. VARIAN M 2000 is a sputtering machine capable of depositing the highest quality thin films, making it ideal for various industries where thin film technology is crucial. Its versatile design, advanced process control, and ease-of-use make it a popular choice for producing high-quality, high-yield thin films.