Used VARIAN M2I #293638944 for sale

VARIAN M2I is a robust, highly reliable sputtering equipment designed to enable researchers, labs, and institutes to conduct experiments in precision thin film deposition. The sputtering system utilizes multisource ion bombardment to sputter materials with highly directional energy, protecting substrates and enabling the deposition of uniform thin films for a variety of applications. VARIAN M 2 I features a programmable, touch-screen interface for custom controller settings, and a built-in vacuum management unit. The machine also provides users with a range of deposition sources, from single-stage to multiple-stage as well as magnetron, diode, and triode sources. Furthermore, M2I is built with a robust process chamber which is shielded from the mechanical vibration, EMI emissions, and ingress of material airborne particles. M 2 I features precision-engineered components and advanced control software, which enable the tool to create high-quality thin film layers. The asset is able to process a variety of materials (such as aluminum, titanium, and silicon) and can be used on substrates ranging in size from 2" to 8". Additionally, multiple elements can be stacked onto a substrate, allowing for multiple thin film applications. VARIAN M2I is equipped with an integrated high-frequency power supply unit (PSU). The PSU is capable of precisely controlling sputtering power and process parameters. This allows users to achieve optimal results and maintain a consistent deposition rate. The PSU also provides a variety of adjustable parameters, such as plasma resonance frequency and RF power. VARIAN M 2 I is designed for maximum effectiveness in a variety of thin film deposition applications. It is especially versatile in terms of configurability, enabling users to quickly adjust the model for different materials, substrates, and layers. This makes it an ideal equipment for research and operations laboratories. M2I provides reliable performance and effective deposition results, ensuring consistent and repeatable thin film deposition.