Used VARIAN M2I #9272644 for sale

VARIAN M2I is a multi-functional ion implanter and monitor, designed for efficient and reliable wafer ion implantation. The device is capable of changing an entire wafer set with almost no human interaction. It is well-suited for producing devices with various types of implant processes. VARIAN M 2 I's beam parameters allow for electron and ion beams to be accelerated to a wide variety of energies, allowing for charge state conversion and implantation under a variety of conditions. It is ideal for use in large-scale production. With its fast and flexible beam configuration, M2I is able to perform adaptive ion implanting. The equipment comes equipped with an automated monitor and diagnostic system to ensure that the unit remains within specific parameters. This machine monitors all of the components from the accelerator to the beamline. It also enables automatic beam steering and alignment for optimal implantation. M 2 I contains an internal real-time data acquisition tool that allows for electronic, thermal, and dynamic process control. This ensures repeatable and dependable implantation, creating a robust process for specific materials and structures. Other components include the RF plasma source for ion generation and the variable aperture asset for optimizing beam collection. The model's computer-controlled components are capable of highly accurate position control. This includes fast scanning across large areas with small beam size changes. VARIAN M2I also has programmable control and hardware features to offer ultimate flexibility and provide a wide range of settings for precise implantation. The equipment's automated self-calibration and diagnostic system allows for optimized performance. It helps to check for proper operation and reduce downtime by allowing for preventative maintenance to be done before any problems arise. To ensure reliable and repeatable production, VARIAN M 2 I includes several systems. These include a statistical recipe optimization unit, which allows for quick and accurate start-up and shut-down and fast cyclic recipe changes. Other systems like the automated implant depth tracking machine and automated mis-match control tool maximize efficiency. M2I is an industry leader in efficient, reliable, and repeatable ion implantation. Its fast and flexible beam configuration and advanced monitoring systems ensure reliable production. With its numerous components and systems, M 2 I offers unbeatable efficiency, productivity, and repeatability.