Used VARIAN / NOVELLUS M2000 #188108 for sale

VARIAN / NOVELLUS M2000 is a high-performance sputtering equipment designed for the deposition of thin films in advanced semiconductor applications. This system consists of three different modules - the Sputter Chamber, the Impulse Plasma Gun, and the hardware platform. The Sputter Chamber is the heart of VARIAN M2000 unit and is used for the ion bombardments and deposition of thin films on wafers. The chamber is equipped with two process chambers for up to five independent targets for max uptime. The chamber utilizes a high-performance DC/RF Dual Magnetron Sputter source with variable voltage, frequency, and power levels for deposition and etching. This machine provides excellent uniformity, stability, and consistency during sputtering operations. The Impulse Plasma Gun is an add-on module that allows for ion bombardment and low-temperature plasma cleaning. This tool is capable of sputter etching, surface cleaning, activation, and chemical etching without impacting film thickness or microstructure. Additionally, the Impulse Plasma Gun is suitable for low-end gas flow rates for closed-loop control, increasing process repeatability and reproducibility. The hardware platform plays an integral role in the performance and efficiency of NOVELLUS M 2000 asset. The platform offers modular design for different process configurations and scalability for advanced process technologies. M2000 offers a high-performance PC-based controls model with a user-friendly interface for process monitoring and data collection. Additionally, the platform supports custom design software for process parameter optimization, tools integration, fault diagnosis, and yield/process optimization. Overall, VARIAN / NOVELLUS M 2000 is an advanced DC/RF-based sputtering equipment designed to ensure excellent film deposition quality, uniformity, and throughput. This system provides exceptional process repeatability for advanced semiconductor device fabrication and production.