Used VARIAN / NOVELLUS M2i #9027015 for sale

VARIAN / NOVELLUS M2i is a sputtering equipment used for materials deposition and thin-film fabrication. The system is designed with modularity in-mind and provides the ability to configure a sputter unit with various components. VARIAN M2i consists of two main components: a vacuum processing chamber and a sputter cathode assembly. The vacuum processing chamber of VARIAN/NVELLUS NOVELLUS M2i is constructed of stainless steel with a gas-tight, vacuum-tight seal to ensure the sputtering process takes place within a clean, high vacuum environment. The chamber is equipped with a turbo pumping feature, a digital temperature sensing and measurement machine, an inert gas introduction tool, and a computer-controlled monitoring and control asset. The sputter cathode assembly of M2i is responsible for discharging high energy particles in order to deposit thin layers of material onto the substrate. The sputter cathode assembly consists of an anode, a crucible holder, and modules to control and maintain the plasma. The control and monitoring components of the assembly include a direct current (DC) bias and an AutoEqualizer module which ensures a consistent deposition rate. VARIAN / NOVELLUS M2i also features several additional applications such as electron energy monitor (EEM) and deposition rate monitor (DRM). The EEM monitors the energy of the incident particles during the sputter process while the DRM monitors the deposition rate. Both of these features provide the user with an informed and controlled method for setting up the sputter process and ensuring that the desired results are achieved. Overall, VARIAN M2i is an advanced sputtering model built for materials deposition and thin-film fabrication. It is a cost-effective and reliable solution that provides the user with an easy-to-configure and efficient means of obtaining the desired sputter process results. The equipment consists of robust components with powerful control and monitoring options, all in a high vacuum environment, to ensure precise and optimized deposition rates.