Used VARIAN / NOVELLUS M2i #9153571 for sale

VARIAN / NOVELLUS M2i is a state of the art deposition tool that uses physical vapor deposition (PVD) sputtering technology in order to deposit thin films on substrates. VARIAN M2i features a dual turret architecture that allows users to quickly switch between outer shield, top and bottom shields, and substrate sputtering processes. This system is capable of creating high quality, high performance coatings with minimized particle contamination and process-dependent substrate heating. The system consists of two independently controlled turrets with two independent power supplies. The turrets are capable of switching between three independent processes, including outer shield sputter, top and bottom shield sputter, and the substrate sputter. The outer shield process utilizes a parallel plate RF source with a maximum power of 400W to sputter the outer perimeter of the substrate and thermally shield the substrate from process products. This process helps minimize particle contamination and substrate heating during the deposition process. The top and bottom shield processes utilize two additional RF sources, with each source providing a maximum power of 400W. These sources are oriented at an angle relative to the substrate so that the ions are directed away from the substrate and maintain higher process temperatures in the area of the ion collision. Additionally, the top and bottom shields act as an additional thermal barrier and allow the deposition material to slowly cover the surface of the substrate. Finally, the substrate sputter process uses a direct current (DC) source with a maximum power of 600W to sputter the material directly onto the substrate. This process helps to ensure that a uniform film is deposited and that the deposition process is highly efficient. Overall, NOVELLUS M2i is an extremely versatile sputtering system that is capable of creating high quality, precision coatings with minimal substrate damage and particle contamination. This highly efficient PVD process is ideal for use in a wide range of thin film applications, including magnetic recording media, hard coatings, and optical films.