Used VARIAN / TEL / TOKYO ELECTRON MB2-730 HT #77414 for sale

VARIAN / TEL / TOKYO ELECTRON MB2-730 HT Sputtering Equipment is a versatile and high-performance thin-film deposition system, designed to be a reliable, cost-effective solution for vacuum thin-film applications. Offering a wide range of process capabilities, this unit is ideal for a variety of applications, including optics, semiconductors, and thin-film electro-optics manufacturing. TEL MB2-730 HT features a floor-mounted, six-cavity magnetron sputtering chamber, with a maximum substrate size of 150mm x 150mm. The chamber is equipped with a 375 kHz RF generator and four independently controlled, separately pumped gas injection lines, allowing for high-quality thin-film deposition in short processing times. VARIAN MB2-730 HT can accommodate up to three target materials in its three target holders and can process single wafers or multiple wafers, up to a maximum of six wafers at a time. TOKYO ELECTRON MB2-730 HT is also equipped with a number of advanced protection and process optimization features, such as ion-beam assisted deposition (IBAD) for improved adherence of dielectrics, focused ion-beam etching for process refinement, and closed-loop temperature and pressure control for accurate and consistent thin-film deposition. The machine also features state-of-the-art diagnostics and controls, such as automatic end-point detection, process monitoring, and advanced metrology capability, enabling users to accurately monitor and control their thin-film processes to achieve higher-quality film deposition over extended periods of time. MB2-730 HT is capable of producing a wide range of deposition profiles, with temperature ranges up to 750°C, operating pressures up to 10Pa, and deposition rates of up to 10nm/min. This tool is designed for single-wavelength operation, making it F4 correctable for fine-tuning of process parameters, and it is compatible with a range of metrology tools, including spectroscopic ellipsometry, Raman spectroscopy and X-ray reflectivity. In conclusion, VARIAN / TEL / TOKYO ELECTRON MB2-730 HT Sputtering Asset is a highly versatile and cost-effective thin-film deposition model, optimized for a variety of processes, including optics, semiconductors and thin-film electro-optics manufacturing. It features state-of-the-art diagnostics and controls, with advanced process optimization features such as IBAD, etching and closed-loop temperature and pressure control. TEL MB2-730 HT is capable of producing a wide range of deposition profiles and is compatible with a range of metrology tools, making it an ideal choice for those looking for a reliable and efficient sputtering equipment.