Used VARIAN / TEL / TOKYO ELECTRON MB2-730 #124470 for sale

VARIAN / TEL / TOKYO ELECTRON MB2-730 sputtering equipment is a versatile thin-film deposition tool used for the formation of thin films with complex chemical compositions for a variety of applications. TEL MB2-730 utilizes magnetron sputtering, which uses a magnetically-confined plasma to sputter-deposit material onto a substrate. This sputtering process is highly controllable, allowing the system to create thin-film deposition with precise composition control, from simple to complex materials. By controlling the amount and type of targets in each chamber, a wide range of materials can be sputter-deposited. VARIAN MB2-730 is comprised of two 1,000 mm x 900 mm chambers. The first chamber, the sputter chamber, uses direct-current (DC) magnetron sputtering using three cylindrical magnetron targets. The second chamber, the IOX/CVD chamber, uses radio frequency (RF) magnetron sputtering to deposit oxide and nitride films, and also has four targets for chemical vapor deposition (CVD). In addition, this unit has a removable heating/cooling plate, allowing for temperature control of the substrate during deposition. This plate also allows for further control over the depositions, enabling the machine to perform in-situ thermal treatments and rapid annealing. MB2-730 tool also has a fully automated asset that controls the deposition process. TOKYO ELECTRON MB2-730 features a programmable process controller (PPC) with 20 available recipes, allowing for accurate, repeatable results. Additionally, the model is equipped with a PC-based graphical user interface (GUI), which allows for easy and intuitive control of deposition parameters. In conclusion, VARIAN / TEL / TOKYO ELECTRON MB2-730 sputtering equipment is an excellent tool for creating thin films with complex chemical compositions. Its versatile deposition process, temperature control capabilities and automated control system make it perfect for a variety of thin-film deposition applications.