Used VARIAN / TEL / TOKYO ELECTRON MB2-730 #130806 for sale

VARIAN / TEL / TOKYO ELECTRON MB2-730 sputtering equipment is an advanced physical vapor deposition (PVD) system designed for a broad range of applications. Using a powerful magnetron source and closed-loop in-situ process monitoring, the unit offers a number of benefits for PVD deposition. The machine utilizes twin-target cathodic arc technology to create a high-density plasma environment, which allows the deposition of thin film materials at a much higher rate than ever before. This, in turn, reduces the total cost of ownership by decreasing the amount of time and energy required to deposit materials. The improved energy efficiency also reduces the environmental impact of PVD technology. The control tool is also advanced, translating rough information into more precise film deposition. It includes a variety of standard process control features, such as monitoring and control of the source power, gas pressure, and exhaust systems. The asset is able to adjust parameters on the fly, allowing users to change the target, deposition rate, and uniformity in real-time. With this, users can produce advanced materials with very high repeatability. The model also supports an effectively unlimited range of substrates, making it a valuable tool for many industries. It is capable of depositing on aluminum, ceramic, glass, and plastic substrates, among others. This allows a wide range of materials to be used in applications such as optical coatings and microfabrication. TEL MB2-730 has shown its usefulness in a variety of applications, and is capable of producing a wide range of materials with wide-reaching effects, from improved optical properties to fabrication of micro-scale components. The equipment is also remarkably efficient, allowing users to reduce costs while maintaining high quality products. As such, it is an ideal solution for many physical vapor deposition needs.