Used VARIAN / TEL / TOKYO ELECTRON MBB 830 #9274344 for sale

VARIAN / TEL / TOKYO ELECTRON MBB 830
ID: 9274344
Wafer Size: 8"
Sputtering system, 8" CTI-CRYOGENICS OB-8 (3) Chambers TiN.
VARIAN / TEL / TOKYO ELECTRON MBB 830 is a sophisticated sputtering equipment designed for use in a variety of semiconductor, medical and industrial applications. It provides a reliable and efficient way to deposit a range of thin films on substrates. The sputtering system consists of a dual-chamber vacuum enclosure with integrated components to provide a controlled environment for the precise deposition of a wide selection of films onto components including flat panel displays, optical devices, magnetic materials, semiconductor memory chips and thin-film transistors (TFTs). TEL MBB 830 includes a low-energy ion source that provides high deposition rates over large areas and produces minimal heat loads. The unit provides a low-pressure plasma source to promote higher sputtering rates with lower operating costs, and greater uniformity over large areas. Its precisely controlled "direct write" electron beam gun machine is designed to assure excellent uniformity of film thickness over large areas. VARIAN MBB 830 also incorporates a custom designed computer tool with host PC and remote control software to provide flexible control of the deposition process. The asset is capable of depositing a wide range of materials such as oxides, nitrides, carbides, silicides, and alloys through its RF magnetron sputter-based technology, with both reactive gases and inert gases. This sputter-based deposition method maintains the stability of the substrate material and can also achieve ultra-high purity film layers in a variety of shapes and sizes. TOKYO ELECTRON MBB 830 is designed for use in volume production runs, providing repeatable, high-quality process results. It is also capable of high throughput (up to 450 x 400mm) for nearly any size substrate, and an excellent source of rotation and tilt axis motion for precise multi-layer film deposition. MBB 830 includes a comprehensive range of process monitoring solutions such as an in-line spectrophotometer, a temperature-controlled robotic sample pick-up model, an electron beam gun spot monitor, an in-house optical metrology equipment, and a through-the-lens video microscope. These solutions provide users with unparalleled control of their thin film results and enable them to sustain quality performance over time. VARIAN / TEL / TOKYO ELECTRON MBB 830 provides high-precision, reliable thin film deposition capabilities and great quality assurance and process control, making it an ideal choice for demanding deposition applications.
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