Used VARIAN / TEL / TOKYO ELECTRON MBB 830 #9274362 for sale

VARIAN / TEL / TOKYO ELECTRON MBB 830
ID: 9274362
Wafer Size: 8"
Vintage: 1995
Sputtering system, 8" CTI-CRYOGENICS OB-8 (3) Chambers TiN 1995 vintage.
VARIAN / TEL / TOKYO ELECTRON MBB 830 is a powerful sputtering equipment capable of performing both thermal and direct current magnetron sputter deposition processes. This versatile system is ideal for a range of applications, including the production of optically active terahertz films, metal and semiconductor films, coatings for high-end optical components, and electrical components. TEL MBB 830's design ensures a safe and reliable operation. A unique ceramic containment vessel is included that can be used with or without a carbon fluoride source vessel to protect and contain the sputtering process. For optimal safety, the unit includes multiple safety features. VARIAN MBB 830 is equipped with an emergency stop/reset button, an enclosure interlock, a temperature sensing device, and an over-pressure release valve. MBB 830 utilizes a standard 'load lock' sputtering chamber, with a viewport and a 12-position wafer cassette. This design is ideal for large-scale film deposition as well as small-scale research and development purposes. In addition, TOKYO ELECTRON MBB 830 is capable of working with both non-reactive (such as Al and Si) and reactive (such as oxide) sputtering gases to achieve maximum film accuracy and uniformity. The machine also comes with an advanced, user-friendly control console. This helps users program their deposition jobs and allows them to monitor progress in real-time. The console is equipped with an active package that allows for wafer transfer, automation of chamber pressure, and the addition of reactive gases for improved deposition accuracy and repeatability. VARIAN / TEL / TOKYO ELECTRON MBB 830 also includes a variety of process tools and materials for achieving superior deposition results. This includes a mechanical power feeder, a low-temperature post-annealing chamber, and a high-temperature baking chamber, all of which can be custom tailored for specific project needs. Furthermore, the tool is capable of working with numerous sputtering sources, such as planar, rotational, and linear sources. In short, TEL MBB 830 is a reliable, flexible sputtering asset equipped with multiple safety features and process tools for maximum accuracy and repeatability. It is ideal for a range of applications, from large optically active film productions to small-scale research and development projects.
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