Used VARIAN / TEL / TOKYO ELECTRON MBB 830 #9274368 for sale

VARIAN / TEL / TOKYO ELECTRON MBB 830
ID: 9274368
Wafer Size: 8"
Vintage: 2000
Sputtering system, 8" CTI-CRYOGENICS OB-8 (3) Chambers TiN 2000 vintage.
VARIAN / TEL / TOKYO ELECTRON MBB 830 is a highly advanced sputtering equipment that is suitable for a variety of applications in the thin-film, R&D, and semiconductor/electronics industries. It is specifically designed for the deposition of ultra-thin films on substrates such as glass, silicon, lithographic resists, and plastic. TEL MBB 830 utilizes a versatile, multi-target, multi-source sputtering system to achieve deposition rates that are up to ten times faster than traditional sputtering systems. This allows for highly efficient film growth and unmatched quality. VARIAN MBB 830 features an integrated, vacuum-sealed chamber that utilizes a low-pressure, inert gas environment to minimize the impact of hostile environments. This allows for safe, steady, and consistent sputtering process control. In addition, the unit has a range of well-designed controllers and accessories for user convenience. TOKYO ELECTRON MBB 830's ultra-high precision platform also allows it to conduct complicated operations, such as multi-layer film growth, and includes an anti-static base plate to ensure that minimal electrostatic charge builds up. The machine also allows for a wide range of sputter target materials, such as metals, alloys, and oxides, and can be used to produce films ranging from a few nanometers to several hundred nanometers thick. MBB 830 also features automatic adjustment and optimization capabilities that allow the user to tailor the material composition of the films by simply changing the sputter rate, temperature, or pressure. Additionally, the tool has a high-power, ultra-low-noise magnetron that allows for exceptional control of film thickness and composition, as well as a feedback mechanism that allows the asset to constantly monitor and adjust the deposition parameters. VARIAN / TEL / TOKYO ELECTRON MBB 830 is an easy-to-use model with an intuitive control equipment as well as on-board data acquisition and analysis tools. This allows users to accurately and quickly adjust film parameters and achieve desired results. Overall, TEL MBB 830 is an essential tool for the deposition of thin films suitable for a multitude of applications in the thin-film, R&D, and semiconductor/electronics industries. VARIAN MBB 830 provides unmatched performance, durability, and ease-of-use due to its integrated, versatile sputtering system, multi-target, multi-source systems, automatic adjustment and optimization technologies, and its extensive range of compatible materials and process parameters. This makes TOKYO ELECTRON MBB 830 a crucial component of any laboratory or factory.
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