Used VARIAN / TEL / TOKYO ELECTRON MBB #293600880 for sale

TEL (VARIAN/VARTOKYO ELECTRON) VARIAN / TEL / TOKYO ELECTRON MBB (Magnetron Sputter Deposition Equipment) is a high-performance, computer-controlled sputter deposition system that is utilized to deposit thin films on a variety of substrates, such as glass, metal, and plastic. The unit is designed to deposit metals, semiconductors, and other materials with the highest accuracy The machine consists of an electromagnetically-accelerated sputtering source, a vacuum chamber, and a control console. The sputtering source has a special magnetron design, which ensures a uniform rate of coating deposition and meets the uniformity requirements of semiconductor chipsets. In addition, the sputtering source is designed to deposit metals, semiconductors, and other materials with the highest accuracy. The tool also has a single head closed-loop design to enable perfect coating coverage. The Vacuum chamber is equipped with a temperature control asset to ensure the process temperature is stable and uniform, providing better process control and improved substrate preparation. The model also includes a gas flow control equipment to provide an optimal supply of sputtering gas, and a gas purification system to remove corrosive gases from the unit. The control console is highly interactive, allowing users to monitor and control the sputtering process with ease. Through the use of a graphical user interface, operators can monitor and adjust the process parameters such as pressure, coating materials, target temperature, power, and sputter. VARIAN / TEL / TOKYO ELECTRON/VARTEL MBB sputter deposition machine is designed to operate in both production and research environments. Its advanced features make it an ideal choice for depositing thin films on any substrate, from delicate glass substrates in R&D applications to large-scale substrates for industrial purposes. Its unique magnetron design ensures a uniform rate of deposition, providing superior coverage and ensuring a consistent metallic film. Furthermore, its temperature control tool ensures a repeatable, accurate, and stable deposition process. With its easy operation and consistent performance, the asset is an ideal choice for thin film deposition.