Used VEECO Spector #9004435 for sale

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Manufacturer
VEECO
Model
Spector
ID: 9004435
Parts System Ion Source 16cm Body: OK Grids w/ quartz: NG Cables: OK Power supplies: NG (can be prepared with additional cost) RFN: Only feedthrough (w/ matching box) Ion Source 12cm Body: OK Grids w/ quartz: NG Cables: OK Power supplies: NG (can be prepared with additional cost) RFN: Only feedthrough (w/ matching box) ITAVS: NG, it has been removed so the system does not work well GFC1100: NG OMS: OK PC's: OK (Unfortunately cannot be tested without ITAVS Motor Driver: NG Targets w/ Backing plates: NG Target Motion control: OK High Speed Substrate fixture: OK Touch screen on the display monitor: NG Display Monitor: For control: NG, For OMS: OK MFC: OK Manuals: OK.
VEECO / DEKTAK Spector is a sputtering equipment designed for applications in the fields of photonics, optoelectronics, medical implant development, and quantum device research. This system allows the thin-film deposition of metals, insulators, and semiconductors to develop nanoscale structures on a substrate. VEECO Spector model is the latest version in VEECO family, and it offers features and functionality previously unavailable in sputtering systems. DEKTAK Spector has four separate sputtering chambers, each with its individual process control and deposition parameters. These chambers are powered by an independent plasma source, which allows for highly efficient and repeatable sputtering of hard magnetic materials. Spector also has an advanced sputter electrode unit with highly flexible adjustment for both distance and angle control. This gives researchers the ability to adjust the total energy flux and velocity of the sputtered material over a wide range of parameters. Additionally, VEECO / DEKTAK Spector's substrate-level protection machine ensures that the deposited films remain uncontaminated during the process. A key feature of VEECO Spector is its dual-magnetic-field source configuration. This essentially means that two magnets with alternating polarity are used to control the sputtering process. This provides more precise control over the range of parameters, allowing for an even and repeatable deposition. Additionally, this tool also reduces the collateral damage caused by ion collisions with the target and substrate surface, allowing researchers to create more durable nanoscale structures. DEKTAK Spector also has a state-of-the-art chamber design and control asset. This gives researchers the ability to precisely control all the parameters during the sputtering process, such as pressure, temperature, and time. Furthermore, Spector has a built-in parameter optimization model that can automatically adjust the parameters to maximize process efficiency. This makes it easier to troubleshoot any problems during the deposition process. In conclusion, VEECO / DEKTAK Spector is an advanced sputtering equipment that offers features and capabilities previously unavailable. Its dual-magnetic-field plasma source, precision control parameters, and parameter optimization system provide researchers with extremely precise control over the deposition process. This enables researchers to develop nanoscale structures and components for a variety of applications that require extremely high performance and extreme durability.
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