Used VEECO / DEKTAK Spector #9160719 for sale
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ID: 9160719
Vintage: 2000
Dual ion beam sputtering system
Dual ion sources:
16 cm Ion source as the major sputtering source
12 cm Ion source as assisting source
Target:
(3) Round targets, 14" dia
Water cooled backing plate
Target materials: 1 Ta & 2 SiO2
Rotation:
High speed fixture
Internal control
Water cooling
Heater: Yes
Pumping system:
CTI CRY-400 On-board
CTI 9600 Compressor
Mechanical pump (US Motor model G78597)
RGA: No
OMS:
VEECO OMS system, excluding tunable laser source
VEECO OMS computer and OMS hardware setup excluding tunable laser
VEECO OMS software loaded with the OMS computer
Controllers Included:
RF-2001 Controller
DC Bias 2051
Neutralizer 2070
Software: Spector version 6.0
Applications:
DWDM Filters
Laser line filters
Packing density filters
Optical thin film for high-power laser applications
Currently installed
2000 vintage.
VEECO / DEKTAK Spector is a sputtering equipment designed for high precision surface profiling. It uses a combination of X-ray surface reflectometry (XSR) and an optical interferometric encoder (OIE) to measure the surface properties of a substrate. VEECO Spector system utilizes a cathode sputtering deposition process to form a layer of deposited material on the sample. The XSR technique enables the surface topology to be accurately determined, while the OIE enables the surface roughness to be measured. The XSR technique involves X-ray radiation being projected onto the sample surface from an X-ray source. The reflected radiation is then received by an X-ray detector and analysed to determine the topology of the sample. The OIE encoder operates in a similar fashion, but instead of being limited to X-ray radiation, any light source can be used. OIE utilises an interference technique whereby light is split into two beams and reflected off the sample surface. The difference in the reflected beams is used to accurately detect the surface profile. DEKTAK Spector sputter unit includes a remote vacuum machine, pressure monitor, and computer interface for controlling the tool settings. The remote vacuum asset is responsible for maintaining the vacuum in the chamber and can be programmed to reach set points from 1.0 mbar up to 1e-8 mbar. The pressure monitor measures the pressure in the chamber and sends alarms when the pressure reaches the set limit. The computer interface is used to control the sputtering source power, deposition rate, substrate rotation, and other parameters. Spector sputter model is used for a range of materials deposition, surface modification and analysis applications including metal depositions, oxides, thin films, sputtered oxides, and nano structures. It's widely used in the memory and electronics industries and enables precise layer control and uniformity. VEECO / DEKTAK Spector sputter equipment can also be used to monitor growth rates in-situ, as well as to analyse the structural properties of the deposited material. In conclusion, VEECO Spector sputter system is an advanced surface profiling and materials deposition unit. It utilises the XSR technique for surface topology determination and the OIE for surface roughness measurement and is used for a range of materials deposition, surface modification and analysis applications. The machine is widely used in the memory and electronics industries and enables precise layer control and uniformity.
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