Used VON ARDENNE Pia Nova #9279044 for sale

VON ARDENNE Pia Nova is a photoresist equipment developed by vacuum coating equipment manufacturer VON ARDENNE. It is a type of photoresist that is used in the production of nanostructures on semiconductor wafers. Pia Nova system utilizes a combination of advanced materials and production technologies to enable ultra-high resolution deposition of photoresist on a wafer. VON ARDENNE Pia Nova photoresist unit uses a proprietary technology called "Creationthrough Subtractive Deposition (CSD)". This allows photoresist to be deposited with a minimum of waste and with a very thin, uniform deposition. The CSD process involves the use of a "parent" stacked photoresist layer made up of multiple layers of thin films, the first of which is a thin film of PMMA (poly-methylmethacrylate). This parent film is then exposed to a plasma beam which etches away the lower layers in order to define the nanostructures desired. After the etch process, Pia Nova machine can then fill the etched nanostructures with a thin, uniform layer of the photoresist layer. The resist layer that will be deposited is determined by the user, and VON ARDENNE Pia Nova tool can deposit resist layers in either a thin continuous layer or in multiple smaller, thicker layers. The ability to deposit multiple layers of photoresist allows for the complex design and fabrication of high resolution components. Pia Nova asset uses a patented tray-related processing model to provide a robust and precise resist application. The trays are resistant to peroxide and environmentally friendly substances, meaning that they can be used in a wide range of industries. It also uses a vacuum deposition technology to ensure that the deposition of the photoresist is even and consistent across the wafer. Finally, VON ARDENNE Pia Nova equipment provides full thermal control, meaning that the user is able to accurately control the temperature of the resist layer during the application process. This ensures that the layer of photoresist is deposited at a consistent and even thickness throughout the entire wafer, further enhancing the quality and accuracy of the nanostructures. Pia Nova photoresist system is an advanced unit that provides the user with a precise, reliable, and economical way to produce high quality nanostructures for the semiconductor industry. With its combination of advanced materials and production technologies, VON ARDENNE Pia Nova machine is an ideal machine for producing nanostructures with a high degree of accuracy and precision.