Used ALLIED HIGH TECH PRODUCTS X-Prep #293812078 for sale

ID: 293812078
Milling, grinding, and polishing system Specialized CNC-based machine for electrical and physical failure analysis (EFA/PFA) X and Y axis: 1 µm resolution, 100 x 100 mm stage travel Z-axis: Closed-loop design, 0.1 µm resolution, 1 µm accuracy Dual-axis tilt control, 0.5 µm resolution Three modes of Z-axis control: Position, Position Force, and Floating Force Variable spindle RPM: 5,000 – 100,000 Pneumatic tool change 12" color touchscreen High definition (720p) live video.
ALLIED HIGH TECH PRODUCTS X-Prep is a versatile and advanced wafer grinding, lapping, and polishing equipment designed for precision machining of various materials used in semiconductor, electronic, and materials science industries. This cutting-edge system offers a range of capabilities to achieve optimal surface finish and flatness required for critical applications such as wafer processing, device fabrication, and materials characterization. X-Prep unit is equipped with a high-speed rotating platen that enables efficient material removal during the grinding and lapping processes. This platen is driven by a powerful motor and can be controlled to achieve precise speed and rotational direction for uniform material removal across the wafer surface. The machine also features a programmable control interface that allows users to set specific parameters such as pressure, speed, and time for automated operation and reproducible results. For wafer grinding, ALLIED HIGH TECH PRODUCTS X-Prep tool utilizes abrasive grinding wheels or diamond grinding discs to remove material from the wafer surface. These grinding tools are available in various grit sizes to accommodate different material hardness and surface roughness requirements. The asset employs a water-based coolant delivery model to ensure efficient heat dissipation and debris removal during the grinding process, which helps prevent thermal damage and maintain consistent grinding performance. In the lapping mode, X-Prep equipment utilizes a flat lapping plate coated with a fine abrasive slurry to achieve high-precision flatness and surface finish on the wafer. The lapping process involves the rotational motion of the wafer against the lapping plate under controlled pressure, allowing for material removal and surface refinement. The system is equipped with a precision pressure control unit that enables users to set and maintain the desired pressure level for optimal lapping performance. The polishing capability of ALLIED HIGH TECH PRODUCTS X-Prep machine is achieved through the use of soft polishing pads and polishing compounds that help achieve mirror-like surface finish and sub-micron level flatness on the wafer. The tool features a dual-motion polishing head that enables both rotational and orbital motion during the polishing process, ensuring uniform material removal and surface refinement across the entire wafer surface. Additionally, the asset is equipped with a programmable polishing parameter control model that allows users to adjust variables such as pressure, speed, and polishing time for customized polishing results. Overall, X-Prep equipment is a state-of-the-art solution for wafer grinding, lapping, and polishing applications, offering advanced capabilities for achieving precise material removal, surface finish, and flatness required for high-performance semiconductor and materials science applications. With its robust design, advanced control features, and versatile operation modes, ALLIED HIGH TECH PRODUCTS X-Prep system provides users with the flexibility and precision needed to meet the demanding requirements of modern wafer processing and materials characterization processes.
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