Used AMAT / APPLIED MATERIALS Mirra Mesa #9203803 for sale

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ID: 9203803
Wafer Size: 8"
Vintage: 2000
CMP System, 8" Wafer shape: Flat Application information: Application: Oxide System: Dry in / Dry out Device type: D-RAM Device geometry: 0.09 Microns Consumed process materials: Polish slurry: STI Platen 1 pad: IC1010 Platen 2 pad: IC1010 Platen 3 pad: IC1010 Pad conditioner: Diaphraghm Pad conditioner head: DDF3 Pad conditioner holder: Standard Factory interface options: Cleaner type: MESA (Converted from reflexion) Megasonics Robot type: APPLIED MATERIALS In situ removal rate monitor: Digital SECS GEM Interface Cassette tank Cassette type: SMIF Installation type: Through the wall Integrated system basic fabs: Fabs 212 Platen and head options: Polishing head: (4) TITAN I Heads (4) Retaining rings Pad wafer loss sensor Slurry delivery options: Slurry delivery: (2) Slurries Slurry flow rate: STD Flow Slurry flow monitor Slurry containment bulkhead: Single containment Slurry loop line: No Slurry dispense arm: Extended rinse arm Slurry leak detector: No DI Water High pressure rinse System safety equipment: Red turn to release EMO button: STD EMO Guard ring System labels: English Smoke detector Umbilicals: Polisher to controller cable: 75FT Controller to monitor cable: 75FT Factory hookup upper exhaust: STD Upper exhaust connection: 8" Drain manifold: 4 Line to FAC Drain adapter: NPT Fitting Castors for mirra system: No Weight distribution plate (Skid pad) User interface: Gray area: Monitor Clean room: Monitor Class 1 cart for monitor Stainless cart Mouse or trackball: PC Mouse Hard disk backup: No Maintenance options: Spray gun: Singly Lapping stone: No Spares: Heads Retaining ring Pad conditioner head Electrical requirements: Line frequency: 50/60 HZ Line voltage: 200 ~ 230V Uninterruptible power supply: UPS Battery Delta connection Power lamp: Green Power connected lamp: No Circuit breaker: 200A AC Outlet box: 100V Wide type GFI: 50mA 2000 vintage.
AMAT / APPLIED MATERIALS / AKT Mirra Mesa is a multi-task wafer grinding, lapping & polishing equipment designed to grind, lap and polish semiconductor wafers for the fabrication of advanced electronic and optoelectronic devices. It combines in-line, single-side grinding, lapping and polishing for a wide variety of semiconductor materials into a single machine, making it an ideal solution for post-fabrication process requirements. AKT Mirra Mesa system incorporates a four-axis motion platform with high precision spindle drive motors and encoders, designed to provide high speed and precise alignment for grinding, lapping and polishing operations. The grinding capabilities range from 0.1 micron to a few hundreds of nanometers, while its lapping and polishing capabilities range from 1 micron down to just a few nanometers. The unit is able to achieve a uniform wafer thickness over the entire area, thereby supporting the highest yield for wafer fabs. The machine's patented air bearing technologies provide an exceptionally stable platform and work surface for critical wafer grinding and polishing. It is also designed with a user-friendly control tool that allows operators to set and adjust parameters for precision grinding, lapping and polishing processes. Additionally, the asset features a modern and versatile programmable logic controller (PLC) allowing users to automatically manage and control the various steps of the process. In terms of processing quality, the model's state-of-the-art technologies ensure accuracy and repeatability of the grinding, lapping and polishing process, as well as robust results regarding film stress, stress uniformity and critical dimension (CD) uniformity. Furthermore, the equipment has the ability to meet a wide range of end-user requirements as it supports various materials, from standard to exotic grades. In conclusion, AMAT Mirra Mesa wafer grinding, lapping and polishing system enables fabs to integrate single-side wafer grinding, lapping and polishing into their processes, thereby supplying them with an exceptionally versatile and reliable machine capable of achieving high yields, uniform wafer thicknesses, precise lapping and polishing accuracies, and robust process results.
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