Used AMAT / APPLIED MATERIALS Mirra Mesa #9203803 for sale
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ID: 9203803
Wafer Size: 8"
Vintage: 2000
CMP System, 8"
Wafer shape: Flat
Application information:
Application: Oxide
System: Dry in / Dry out
Device type: D-RAM
Device geometry: 0.09 Microns
Consumed process materials:
Polish slurry: STI
Platen 1 pad: IC1010
Platen 2 pad: IC1010
Platen 3 pad: IC1010
Pad conditioner: Diaphraghm
Pad conditioner head: DDF3
Pad conditioner holder: Standard
Factory interface options:
Cleaner type: MESA (Converted from reflexion)
Megasonics
Robot type: APPLIED MATERIALS
In situ removal rate monitor: Digital
SECS GEM Interface
Cassette tank
Cassette type: SMIF
Installation type: Through the wall
Integrated system basic fabs: Fabs 212
Platen and head options:
Polishing head: (4) TITAN I Heads
(4) Retaining rings
Pad wafer loss sensor
Slurry delivery options:
Slurry delivery: (2) Slurries
Slurry flow rate: STD Flow
Slurry flow monitor
Slurry containment bulkhead: Single containment
Slurry loop line: No
Slurry dispense arm: Extended rinse arm
Slurry leak detector: No
DI Water
High pressure rinse
System safety equipment:
Red turn to release EMO button: STD
EMO Guard ring
System labels: English
Smoke detector
Umbilicals:
Polisher to controller cable: 75FT
Controller to monitor cable: 75FT
Factory hookup upper exhaust: STD
Upper exhaust connection: 8"
Drain manifold: 4 Line to FAC
Drain adapter: NPT Fitting
Castors for mirra system: No
Weight distribution plate (Skid pad)
User interface:
Gray area: Monitor
Clean room: Monitor
Class 1 cart for monitor
Stainless cart
Mouse or trackball: PC Mouse
Hard disk backup: No
Maintenance options:
Spray gun: Singly
Lapping stone: No
Spares:
Heads
Retaining ring
Pad conditioner head
Electrical requirements:
Line frequency: 50/60 HZ
Line voltage: 200 ~ 230V
Uninterruptible power supply: UPS Battery
Delta connection
Power lamp: Green
Power connected lamp: No
Circuit breaker: 200A
AC Outlet box: 100V
Wide type GFI: 50mA
2000 vintage.
AMAT / APPLIED MATERIALS / AKT Mirra Mesa is a multi-task wafer grinding, lapping & polishing equipment designed to grind, lap and polish semiconductor wafers for the fabrication of advanced electronic and optoelectronic devices. It combines in-line, single-side grinding, lapping and polishing for a wide variety of semiconductor materials into a single machine, making it an ideal solution for post-fabrication process requirements. AKT Mirra Mesa system incorporates a four-axis motion platform with high precision spindle drive motors and encoders, designed to provide high speed and precise alignment for grinding, lapping and polishing operations. The grinding capabilities range from 0.1 micron to a few hundreds of nanometers, while its lapping and polishing capabilities range from 1 micron down to just a few nanometers. The unit is able to achieve a uniform wafer thickness over the entire area, thereby supporting the highest yield for wafer fabs. The machine's patented air bearing technologies provide an exceptionally stable platform and work surface for critical wafer grinding and polishing. It is also designed with a user-friendly control tool that allows operators to set and adjust parameters for precision grinding, lapping and polishing processes. Additionally, the asset features a modern and versatile programmable logic controller (PLC) allowing users to automatically manage and control the various steps of the process. In terms of processing quality, the model's state-of-the-art technologies ensure accuracy and repeatability of the grinding, lapping and polishing process, as well as robust results regarding film stress, stress uniformity and critical dimension (CD) uniformity. Furthermore, the equipment has the ability to meet a wide range of end-user requirements as it supports various materials, from standard to exotic grades. In conclusion, AMAT Mirra Mesa wafer grinding, lapping and polishing system enables fabs to integrate single-side wafer grinding, lapping and polishing into their processes, thereby supplying them with an exceptionally versatile and reliable machine capable of achieving high yields, uniform wafer thicknesses, precise lapping and polishing accuracies, and robust process results.
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