Used AMAT / APPLIED MATERIALS Mirra Mesa #9196931 for sale

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ID: 9196931
CMP System Includes: PC Board: Mirra standard P3 333MHZ  with NT System Fabs: RORZE Open cassette without HEPA (RS202) EPD System: P1: Full scan P2: Full scan P3: No Wet robot: Wet robot gasket Wafer handler/Reed Assy Eject vacuum Head: (4) Head assy, 8" titan (4) Head sweep motors (4) Ball screws and nuts (4) Slipout sensors (4) Head clamps UPA: (4) Mirra standard 3-zones UPA (4) Union rotary 3 port Pad conditioner: (6) PC head bearings (3) PC Rotation belts (3) Gears (Sweep motor) (3) PC Harmonic drives Slurry delivery system: (6) 2 Line peristaltic pumps (3) 2 Lines slurry dispense arms (L Arm) HCLU: Pedestal DI pressure control valve Eject vacuum Load cup linear bearing CYL AIR 25MM BOREX 40MM STR DBL-ACT/SGL ROD Pedestal film Platen: (3) Upper platen (3) Motor and gear box Input Station: Slide rail 60MM WX750 MML Chrome plated Cleaner: Cleaner HEPA fan Mega: Mega idler roller (2) Mega rollers Mega roller/roller belt Mega motor/roller belt Transducer plate Mega tank Mega generator Brush: (6) Brush roller washers (2) Brush roller assy kits (4) Brush roller belts (2) Brush chem direct feeds (4) Brush mandre/sleevel SRD: (4) SRD Pushpin Shield movable hydrophilic SRD200MM.
AMAT / APPLIED MATERIALS / AKT Mirra Mesa wafer grinding, lapping & polishing system is a precision machine designed to produce ultra-smooth silicon wafers for semiconductor applications. This technology utilizes a grinding wheel, a lapping plate, and a polishing cloth in unison to achieve the desired surface finishes. The grinding wheel efficiently removes large amounts of material from the wafer substrate. It operates with diamond or carbide abrasive particles which is mounted to a metal spindle that rotates at high speeds. With the proper duration and pressure, the grinding wheel can efficiently remove features such as burrs, pits, and other smooths the surface of the wafer. The second stage of the process is lapping, which involves using a flat lapping plate and abrasive slurry to smooth the wafer. The lapping plate has an abrasive on one side which is constantly polished while being continuously pressed against a rotating wafer substrate. This results in a flat mirror finish to the wafer, removing any micro fibers and pits. The final stage is polishing. Polishing is done using a cloth-discolored polishing wheel that is loaded with different types of micro abrasive particles for a fine finish and enhanced surface reflectivity. This is done by pressing the polishing wheel against the rotating wafer making use of different techniques such as diamond paste, slurries, and various chemical agents to eliminate any remaining surface defects. The entire process is monitored in real time utilizing clean room protocols and its results are validated using particle analysis methods and measurements of surface roughness. AKT Mirra Mesa's advanced design ensures that wafers are produced meeting the most stringent quality requirements, allowing for the production of precision semiconductor devices.
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