Used AMAT / APPLIED MATERIALS Reflexion LK #9113925 for sale

Name: AMAT / APPLIED MATERIALS Reflexion LK
Brand: AMAT / APPLIED MATERIALS
SKU: 9113925
Availability: SoldOut

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Wafer Grinding, Lapping & Polishing

Manufacturer

AMAT / APPLIED MATERIALS

Model

Reflexion LK

ID: 9113925

Wafer Size: 12"

Vintage: 2002

Oxide STI Systems, 12" Wafer: SNNF Application: OXIDE System DRY IN/DRY OUT Process Type: ALL Device Type: LOGIC Device Geometry: 0.18 MICRONS Cleaner Type: MESA Robot Type: KAWASAKI WET Robot Megasonics: YES System Skins: CLEAR SKINS Software Version OS Software: WINDOW NT (P-1.6GHZ CPU) Polisher Software: rp386.1_64 Mesa Software: CB B3.1_23 Loader Port Software: rp386.1_64 ISRM Software: ID21e8 Consumed Process Materials Polish Slurry: Standard pump and flow gauge Buff Slurry: N/A Platen 1 Pad: STANDARD PLATEN WITH PAD CONDITIONER Platen 2 Pad: WET TYPE PLATEN NO PAD CONDITIONER Platen 3 Pad: STANDARD PLATEN WITH PAD CONDITIONER Pad Conditioner Disk: N/A Pad Conditioner Head: DDF3 Pad Conditioner Disk Holder: UNIVERSAL Factory Interface Options Platen 1 ISRM Unknown Platen 2 ISRM DIGITAL ISRM Platen 3 ISRM Unknown In Line Metrology N/A Advanced Process Control NONE SECS GEM Interface YES Integrated System Basic FABS 300mm FI Loader port(3PORTS) Integrated System NOVA 3060SYSTEM INTERFACED FA Robot Blade 300mm Standard FI Robot Blade Bar Code Reader NO Factory Automation YES Platen and Head Options Polishing Head TITAN II HEAD Upper Pneumatics Assembly PROFILER UPA(4PORT UPA) Pad Wafer Loss Sensor Single SENSORS W/ LIGHT PIPE Platen Temperature Control N/A Platen Temp Control Cable N/A Upper Platen Coating Unknown Slurry Delivery Options Selected Option Slurry Delivery 2 SLURRIES Slurry Flow Rate STANDARD FLOW Slurry Flow Monitor NO Slurry Containment Bulkhead DOUBLE CONTAINMENT Slurry Facilities NONE Slurry Loop Line N/A Slurry Loop Line A NO Slurry Loop Line B NO Slurry Loop Line C NO Slurry Dispense Arm Standard Slurry Leak Detector YES Clean Plumbing NO DI Water NONE System Safety Equipment EMO Guard Ring YES EMO IO NO LOTO Box NONE Smoke Detector YES Polisher Slurry Leak Sensor YES Mesa Slurry Basin Leak Sensor N/A Electrical Requirements Selected Option Uninterruptible Power Supply NONE Delta Connection YES Power Lamp GREEN LAMP Power Connected Lamp NO Circuit Breaker Polisher:170A, Cleaner:150A AC Outlet Box YES GFI Type STANDARD 30mA Isolation Transformer N/A Isolation Transformer for Mesa NO Factory Hookup Upper Exhaust N/A Upper Exhaust Material N/A Lower Exhaust EXIT BELOW TOOL Exhaust Vent Interlock N/A Upper Exhaust Connection N/A Drain Manifold 4 Line Drain Adapter NPT FITTINGS Elbow Fitting For Drain Pan NO Castors for Mirra System NO Weight Distribution Plate NO DIW Inlet Assembly W/O CDA REGULATOR Internal Vacuum Venturi NO User Interface Monitor Selection 2 FPD Monitor 1 Location FPD ON SIDE OF Wet robot Skin Monitor 2 Location FPD ON CART Class 1 Cart for 1 Monitor 1 Stainless Steel Cart 0 Mouse or Trackball MOUSE Printer NONE Hard Disk Backup NO Start Stop Button STD Light Towers Selection FI Unit FABS Light Tower FABS Tower Mounting Type HALF MOON FLUSH MOUNTED FABS Tower No of Colors 3 COLOR FABS Tower Lamp Type INCANDESCENT FABS Tower Colors Sequence RYG Cleaner Options Mesa Cleaner YES JMF Wafer Handling Kit NOT APPLICABLE Megasonics Module Delivery Tank MEGASONICS Megasonics Delivery Type PRESSURIZED Chemical A Unknown Chemical B Unknown Scrubbers Module Scrubber 1 Delivery Type PRESSURIZED FEED Scrubber 1 Chemical Customer will inform Scrubber 2 Delivery Type PRESSURIZED FEED Scrubber 2 Chemical Customer will inform Spin Rinse Dry Module Selected Option Heater Lamp YES SRD Exhaust and Drain Lines SINGLE Upper Electronics Box STANDARD UEB CE Marked 200-230 V, 50/60 Hz Currently de-installed 2002 vintage.

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AMAT / APPLIED MATERIALS Reflexion LK is a next-generation wafer grinding, lapping and polishing system designed for dramatic improvements in advanced semiconductor device manufacturing. AMAT Reflexion LK features a high rate of speed for maximum throughput, helping to make the most efficient use of operator time, space, and resources. APPLIED MATERIALS Reflexion LK features a host of specialized features for efficient wafer processing. The unit comes with a built-in high speed motor that is capable of operation between 5,000 and 10,000 RPM. The grinding operation takes place in dual planes, allowing simultaneous grinding in two planes. This two-plane lapping action provides optimum results and enables the production of devices with very precise edge profiles. Reflexion LK is also equipped with an independent high speed polishing head which is capable of achieving superior surface finishes on a variety of substrates. The polishing head moves in two directions, allowing precise lapping action on individual wafers. The resulting surface finish is much smoother than achievable with conventional polishing techniques. AMAT / APPLIED MATERIALS Reflexion LK is capable of automatically controlling and adjusting the various elements of the fabrication process. A user control panel allows users to customize the parameters of the grinding and lapping processes, as well as the polishing heads. The unit also features an automatic size recognition function which helps to further streamline processing time. Finally, AMAT Reflexion LK also features an efficient cooling system which helps to ensure consistent results and repeatable process results. This is especially important in the production of precision devices, where precise and consistent results are essential. The system is designed to ensure all the components of the process remain at the optimal temperature for optimal performance and efficiency.