Used AMAT / APPLIED MATERIALS Reflexion LK #9116998 for sale

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ID: 9116998
Copper CMP system, 12" Base system: Reflexion LK: 4-head, 3-platen, polishing system Dry in, dry out Polisher skins: Dark P1, P2, P3, P4; 4910 compliant Gap wash: 120° nozzles Load cup wafer exchanger: enhanced counter balance springs Nova 3090 ready: none Monitor 1 location: cart Monitor 2 location: ergo arm type Light tower: factory interface and polisher sides Software: LK Software: lp3B4.5_29 Factory interface: b4.9_14 Beta ISRM / RPTC: isB3.0_10 RTPC: B3.0_11 Platen 1: Platen type: high speed (<=350 RPM) Endpoint: RTPC High pressure rinse flow meter: 1350-00195 (4.6 L/min) FLOW METER ASSY 1/2OD 1.6-20LPM PFA Rinse arms: high pressure/flow Flow meter: 50-500 mL/min Temperature control: platen cooling water Platens 2,3: Platen type: high speed (<=350 RPM) Endpoint: full scan optical ISRM High pressure rinse flow meter: 1350-00195 (4.6 L/min) FLOW METER ASSY 1/2OD 1.6-20LPM PFA Rinse arms: high pressure/flow Flow meter: 50-500 mL/min Temperature control: platen cooling water Polisher: Polisher technology: slurry and pad Polishing head: Contour Gen III (0.5 to 5.0 psi) - (6) Zones - Maximum pressure: RR (15 psi), Z1 (10 psi), Z2 (5 psi), Z3 (5 psi), Z4 (5 psi), Z5 (5 psi) Cross break: N/A Pad wafer loss sensor: dark pad sensor Inter-platen clean: no ISRM Laser key switch: yes Slurry delivery system: 5 x 10 CLC SDS Head 1 Power Cable: 0150-16277CABLE ASSY, HR1, DRIVER-MOTOR POWER, REF Head 2 Power Cable: 0150-16278CABLE ASSY, HR2, DRIVER-MOTOR POWER, REF Head 3 Power Cable: 0150-16279CABLE ASSY, HR3, DRIVER-MOTOR POWER, REF Head 4 Power Cable: 0150-16280 CABLE ASSY, HR4, DRIVER-MOTOR POWER, REF Head 1 Encoder Cable: 0150-16281CABLE ASSY, 300MM, HR1, DRIVER-RESOLVER Head 2 Encoder Cable: 0150-16282CABLE ASSY, 300MM, HR2, DRIVER-RESOLVER Head 3 Encoder Cable: 0150-16283CABLE ASSY, 300MM, HR3, DRIVER-RESOLVER Head 4 Encoder Cable: 0150-16284CABLE ASSY, 300MM, HR4, DRIVER-RESOLVER G4+ UPA: SMC UPA G4+ UPA: SMC UPA Cleaner meg: Chemical 1:CLC 1-250 ml/min Chemical 2:CLC 1-250 ml/min Brush box 1: Chemical 1: 0-1250 ml/min Chemical 2: 0-1250 ml/min Brush box 2: Brush LDM Type: 2-chem, inline, mixed Chemical 1: 0-1250 ml/min Chemical 2: 0-1250 ml/min Dryer module: Dryer type: vapor dryer Recovery nodule: N/A Output station damper: Viton cap 2010 vintage.
AMAT / APPLIED MATERIALS Reflexion LK is a state-of-the-art wafer grinding, lapping, and polishing (G/L/P) equipment that offers superior control and precision during semiconductor manufacturing. The system features an integrated workstation with large flat plate grinding, lapping, and polishing blocks; an automated one- or two-sided grinding/lapping platform; a high speed loader/unloader; and a full suite of process and parameters monitoring, control, and analysis tools. The integrated driving unit and high precision, low-load bearing mechanism enables high level of repeatability and accuracy. AMAT Reflexion LK machine has a very rugged construction for strong performance and long-term durability. An advanced heater and cryogenic cooling stage are integrated into the tool to provide a highly repeatable thermal expansion coefficient, ensuring a consistent finish on multiple wafer lots. With its low noise and vibration, the asset delivers excellent result with minimum damage to delicate wafers. The one-sided grinding/lapping plate has a total load capacity of 400 kg and offers uniform and precise over travel. A combined main and second stage grinding action is supported to achieve the desired surface finish. Its flatness is ensured by high-precision rail-guided linear motion, which, together with the adjustable compensator, keeps any differences in base surface down to 0.002 mm/m. Moreover, APPLIED MATERIALS Reflexion LK model comes with a user-friendly software interface, allowing complete process control. Any parameters that need adjusting can be changed with the click of a button. The software is also integrated with a modern visualization equipment which can display data in 3D graphics. Overall, Reflexion LK system is a powerful, reliable, and user-friendly wafer grinding, lapping, and polishing unit that provides superior performance and accuracy. It is ideal for semiconductor manufacturers who demand superior results in the shortest time.
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