Used APPLIED MATERIALS Mirra Mesa #73051 for sale

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ID: 73051
metal layer CMP system, copper, 8" Software license, re-installation and startup to Tier II Mirra Mesa CMP Original W system - running Cu Mesa cleaner One monitor, trackball 50 ft cables InSitu removal rate monitor (ISRM) detectors on all 3 platens 50ft ISRM cables Standard cassette tank Titan 2 heads for tungsten AEP retaining ring Pad conditioner: DDF3 - new design with clean up spray nozzle, N2 purge Extended rinse slurry dispense arm Platten Pad: Process kit with IC1000 pad Standard Platten no temperature control Wafer loss sensor with light pipe 3 slurries (AB1, AB2, AC3) 1 DIW per platten, std flow, without flow monitor One drain line to facilities - all drains manifold into one NPT drain fittings Electronic control box for slurry monitoring only Light tower: 3-color vertical, Red/Green/Yellow with flash and buzzer No key switch, compatible with all light towers and no light tower Lower exhaust for standalone system Remote start/stop button on polisher Guard ring on all EMO (CE compliant) Single spray gun No Window in side panel Tie-downs on polisher & controller feet No UPS Smoke detector in controller No pad puller, for one line to facilities option Nanometrics Universal disk holder ABT Universal disks Cass present sensor Wafer mapping Kit Cascading Ergo fabs w/o filter 2006 vintage.
APPLIED MATERIALS Mirra Mesa is the ideal wafer grinding, lapping and polishing equipment for those who need to maintain tight tolerances with excellent surface finishes. The system is designed to efficiently grind and lap wafers to a consistent, high precision finish without compromising the production process. It is powered by greater than 10kW of servo motorized spindle power, combined with advanced motion control electronics and a high performance abrasive wheel, as well as built-in calibration and process monitoring features. The unit yields a superior surface finish by utilizing a coarse grind on its various stages, but is capable of producing finer surface finishes when needed. Using a hybrid design, the grinding wheel utilizes a combination of high-performance abrasive material, diamond grit, and carbide grit to ensure that the wafer remains very smooth throughout the process. The wheel's design incorporates a wide range of spindle speeds and step advance rates to provide much faster grind and finish speeds as needed. The wheel is also equipped with a unique oscillation feature for improved accuracy and uniformity. To ensure the utmost in process control, Mirra Mesa machine includes a digital-analog-hybrid controller for precise control over the grinding and lapping process. This allows the operator to adjust the spindle speed or the oscillating speed with the click of a button. In addition, the tool monitors process temperatures, pressure, force, vibration, and other dynamics in order to make corrections as needed. In addition, the asset offers a variety of safety features such as an automated emergency shutoff and an emergency delay button in order to ensure safe operation. The model also features a zero-force compliance equipment to help protect the grinding wheel and prevent it from breaking. Finally, the system is equipped with a wide range of accessories, including various diamond and carborundum grits, wafer holders, and chucks, as well as a wide range of process monitoring and control software. All of this adds up to an efficient, controllable grinding, lapping, and polishing unit that can precisely and uniformly finish wafers with tight tolerances and a superior surface finish.
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