Used BUEHLER Ecomet 3000 #293759596 for sale

BUEHLER Ecomet 3000
ID: 293759596
Polisher.
BUEHLER Ecomet 3000 is a wafer grinding, lapping and polishing equipment designed to meet the demands of high throughput, high quality semiconductor manufacturing. The system is designed to achieve consistent surface finishes of less than 1nm RMS roughness and is calibrated to match the standards set by semiconductor manufacturers. Ecomet 3000 has a built-in wide range of capabilities for grinding, lapping, and polishing wafers up to 8" in diameter. It has a bench top platform with a 10x magnification microscope, diamond steel grinding wheel, and an automated optical measurement and virtual metrology unit. The machine works by using a combination of diamond and steel grinding wheels to grind and lap the surface of the wafer to the desired finish. The grinding and lapping process is repeated until the desired surface finish is achieved. Once the desired surface finish has been achieved, the tool then uses a combination of diamond polishing pads and slurry to produce a super-smooth finish on the surface of the wafer. The asset has a range of options which allow users to tailor their wafer grinding, lapping and polishing process to the specific needs of their particular process. These options include various wheel, diamond, and polishing pad types and sizes in order produce different types of finishes depending on the application. The model is also capable of analyzing surface images in order to determine the best grinding and polishing settings to achieve the desired surface finish. BUEHLER Ecomet 3000 also includes a state-of-the-art software package which can be used to monitor and control the process in real-time, ensuring the best possible results. Overall, Ecomet 3000 is a versatile, reliable and cost-effective solution for wafer grinding, lapping and polishing. It is designed to meet the needs of high throughput and high quality semiconductor manufacturing and is capable of achieving surface finishes of less than 1nm RMS.
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