Used EBARA EPO-222 #293775099 for sale

EBARA EPO-222 is a versatile, multi-purpose wafer grinding, lapping & polishing equipment for manufacturing grade silicon and compound semiconductor materials. The system has been designed for the maximum versatility and convenience, ensuring the efficient production of high-end wafers and substrates. This unit allows for fast surface grinding and polishing, as well as the lapping and deburring of wafer edges. The state-of-the-art machine features a vacuum wafer holder, a robust 200-mm diameter plate and an adjustable working speed for comprehensive through-and-through grinding. The tool also contains an embedded heater and automatic temperature control for precise and uniform heating of the workpiece. The adjustable speed is customizable to the range of 5,000 to 10,000 rpm, allowing for optimal grinding and polishing results. Additionally, a scanning centering and rotational positioning mechanism ensures the accuracy of the manufactured wafers. The external and internal grinding wheels of EBARA EPO222 are made to the highest quality and specification which allows them to have a long working life. In addition, grinding wheels are fixed and secured to the asset's housing with a flexible locking mechanism. The grinding wheels also feature an EC-based control model and a position error detection device that helps eliminate any errors in rotating the grinding wheels. The lapping and deburring tool of EPO 222 features a variable movement speed, a fast-axis adjustment, and a servo-controled drive for precise movement and consistency in processing. In addition, the lapping tool can be operated in both rotary and linear motion mode for efficient material removal. Furthermore, the equipment comes with an advanced dust-collecting chamber to reduce airborne dust during the grinding process, thus creating a safe and safe environment. Moreover, safety features are included such as protective scanners, proximity switches and emergency switches, with safety interlocks to prevent unnecessary accidents. EPO222 is also highly efficient, boasting an impressive energy consumption rate of a mere 3KW. This system is an ideal choice for the precise and precise fabrication of a wide variety of semiconductor materials.