Used G&N V400 #9208430 for sale
URL successfully copied!
Tap to zoom
ID: 9208430
Ceramic wafer grinding machine
With its polymer concrete casting for better vibration absorption
Improve structural integrity
Rigidity & stiffness to grind advanced materials
Technical data:
Motor: 4 kW
Spindle speed: 1450 RPM
Total connected load: 8 kW
Chucks: 28x2” 16x3” 12x4” - 9x5” 6x6” 3x8” 1x12”
Rotary tabl: 520 mm
Rotary table speed: 1 - 30 rpm
Cup grinding wheel:
Vitrified: 250 x 40 x 76
Diamond / CBN: 250 x 40 x 76
Z-Axis & rotary table motion: PMAC-Lite (4 Axes) Control
Compressed air: 60 - 90 PSI
Fine down feed:
Range: 200 mm
Step: 1 µm
Machine control:
Retrieve data and communicate directly with program 15" TFT touch screen & industrial computer support
Dual spindle machine for fast stock removal & ultra-fine surface finish
Coolant treatment:
Closed-loop chiller controls grinding coolant temperature & coolant
Integrated filter system separates Ga As & other material particles for disposal & reclaiming
Power supply: 220/380/440 V, 60 Hz.
G&N V400 Wafer Grinding, Lapping and Polishing Equipment is a powerful and highly efficient machine designed for wet- and dry-grinding, lapping and polishing of silicon wafers up to 8" diameter. The system is composed of an enclosed stainless steel grinding tank, with integrated circulation and filtration systems, a vertical motor-driven base plate, and an upper polishing platen, all connected to the computer-controlled main controller. The unit operates using a unique 3-axis motion machine, consisting of a vertically orientated motor-driven base plate, for rotation and tilt adjustment, and an upper polishing platen, providing a precise lateral and radial movement. The motion tool provides a highly accurate and precise grinding and polishing result. The polishing platen is equipped with a precision air bearing for vertical rotation of the wafer. The wafer grinding process is controlled via a dedicated control unit which allows the user to adjust the parameters such as grinding speed, pressure, time and shape of grinding stone or pad. The asset is also equipped with a high-precision touch probe to ensure accurate surface roughness measurements can be taken during the grinding process. The model can be further equipped with a range of accessories designed to improve productivity. A rotating turret-style lifting equipment is available, which provides quick and easy loading and unloading of the wafer into the grinding tank. A vacuum fixture system is also available for perfect alignment of the wafer. V400 Wafer Grinding, Lapping and Polishing Unit is a highly efficient and precise production machine suitable for a range of thin-film and wafer applications. The fine control and easy loading and unloading capabilities make the tool ideal for batch processing, providing excellent quality and productivity.
There are no reviews yet