Used LANDIS 3SE #293827528 for sale

ID: 293827528
Vintage: 2007
Grinding machine Engine speed: 1200 RPM Job head turnover: 333 RPM Maximum stone age: 8500 RPM Worn stone diameter: 558 mm Shaft pulley diameter: 165 mm Motor pulley diameter: 178.6 mm Stone diameter: 762 mm Power supply: 400 V, 50 Hz 2007 vintage.
LANDIS 3SE is a cutting-edge wafer grinding, lapping, and polishing equipment designed to provide advanced semiconductor wafer processing capabilities for the microelectronics industry. This system is equipped with state-of-the-art technologies and features that ensure precision, efficiency, and reliability in the preparation of semiconductor wafers for downstream manufacturing processes. The key components of 3SE unit include a robust grinding module, a versatile lapping module, and a high-precision polishing module. Each module is designed to perform specific tasks in the wafer processing workflow, allowing for seamless transition between grinding, lapping, and polishing stages. The grinding module of LANDIS 3SE machine is equipped with advanced abrasive wheels and high-speed spindle units that enable rapid material removal and precise wafer thinning. This module is capable of achieving ultra-flat wafer surfaces with minimal subsurface damage, ensuring high quality and uniformity in the processed wafers. The lapping module of the tool is designed to provide high-precision material removal and surface finishing capabilities for semiconductor wafers. Utilizing a combination of abrasive slurry and rotating lapping plates, this module can achieve exceptional flatness and surface smoothness in the processed wafers, making it ideal for applications that require stringent dimensional control and surface quality. The polishing module of 3SE asset is designed to deliver superior surface finishing and polishing performance for semiconductor wafers. Equipped with advanced polishing pads, slurry delivery systems, and pressure control mechanisms, this module can achieve mirror-like surface finishes with sub-nanometer roughness values, meeting the requirements of advanced semiconductor device fabrication processes. In addition to its core processing modules, LANDIS 3SE model features a sophisticated control equipment that enables precise process parameter optimization, real-time monitoring, and data logging for quality assurance and process traceability. The system is also equipped with automatic wafer handling mechanisms, robotic loading and unloading systems, and wafer mapping capabilities, enabling high-throughput processing and operational efficiency. 3SE unit is designed with a modular architecture that allows for easy integration of additional process modules, such as cleaning stations, metrology systems, and inspection tools, to create a comprehensive wafer processing solution tailored to specific application requirements. The machine is also built with user-friendly interfaces, intuitive software control, and remote monitoring capabilities, ensuring ease of operation and maintenance for semiconductor manufacturing facilities. Overall, LANDIS 3SE wafer grinding, lapping, and polishing tool represents a cutting-edge solution for semiconductor wafer processing, offering advanced capabilities, high precision, and reliability for the production of high-quality wafers used in a wide range of microelectronics applications.
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