Used REVASUM 7AF-HMG #293802488 for sale
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ID: 293802488
Wafer Size: 6"
Vintage: 2022
Grinder, 6"
Spindle type: Air bearing
Spindle speed: 500-4300 RPM
Spindle motor output: 8 HP
Work chuck speed: 20-700 RPM
Work chuck type: Ceramic, Porous vacuum
Chuck, 6"
Spin / Rinse / Dry: Vacuum chuck
GENMARK GB4S Robot
No OCR
2022 vintage.
REVASUM 7AF-HMG is an advanced wafer grinding, lapping, and polishing equipment designed for the semiconductor industry. This cutting-edge equipment offers high-precision processing capabilities to meet the demanding requirements of wafer manufacturing. 7AF-HMG system represents the latest technology in wafer processing, delivering superior results in terms of surface finish, flatness, and edge profile. At the core of REVASUM 7AF-HMG unit is a robust platform that integrates grinding, lapping, and polishing functions in a single machine. This all-in-one solution allows for seamless wafer processing, minimizing the need for manual interventions and improving overall efficiency. The machine is equipped with state-of-the-art components and advanced control mechanisms to ensure consistent and reliable performance across different wafer sizes and materials. One of the key highlights of 7AF-HMG tool is its precision grinding capabilities. The asset utilizes advanced grinding technologies to achieve a high level of accuracy and control in material removal. This precision grinding process is essential for shaping the wafer to the desired thickness and flatness specifications required for semiconductor device fabrication. The model features a range of grinding wheels and abrasives that can be tailored to specific material removal needs, ensuring optimal results for different wafer types. In addition to grinding, REVASUM 7AF-HMG equipment offers lapping and polishing functionalities to further enhance the surface quality of the wafers. Lapping is a critical step in wafer processing that helps achieve the desired flatness and smoothness of the wafer surface. The system is equipped with advanced lapping tools and techniques that can efficiently remove imperfections and surface irregularities, resulting in a uniform and precisely finished wafer. Polishing is the final stage in the wafer processing cycle, which aims to improve the surface smoothness and reflectivity of the wafer. 7AF-HMG unit features sophisticated polishing mechanisms that can achieve mirror-like finishes on the wafer surface, ensuring optimal performance in downstream semiconductor processes. The machine offers a range of polishing options, including chemical-mechanical polishing (CMP), to address specific material requirements and achieve the desired surface quality. REVASUM 7AF-HMG tool is designed with a user-friendly interface and intuitive controls to streamline operation and maximize productivity. The asset's advanced automation capabilities enable precise control over the wafer processing parameters, allowing for customized processing recipes and real-time monitoring of key performance metrics. Additionally, the model is equipped with comprehensive safety features to ensure operator protection and equipment integrity during operation. Overall, 7AF-HMG equipment represents a state-of-the-art solution for wafer grinding, lapping, and polishing in the semiconductor industry. With its advanced technologies, precision processing capabilities, and user-friendly design, this system is poised to deliver superior results in wafer manufacturing applications, supporting the development of next-generation semiconductor devices.
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