Used SCHNEIDER SLG 301 #293799231 for sale
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ID: 293799231
Vintage: 2006
Spherical surface grinder
SIEMENS Sinumerik 840D
5-Axis
X-Axis travel: 660 mm
Feed rate: 0.01 - 5000 mm/min
Positioning accuracy: ± 0.001
Y-Axis travel: 0.1 mm
B-Axis Travel: ± 50°
Power supply: 24 V, 50 Hz, 8 kw, 25 A
2006 vintage.
SCHNEIDER SLG 301 is a cutting-edge wafer grinding, lapping, and polishing equipment that offers unparalleled precision and efficiency in the semiconductor manufacturing industry. This advanced system is designed to meet the demanding requirements of semiconductor fabrication processes, ensuring high-quality results and increased productivity in wafer processing. At the heart of SLG 301 is its innovative grinding, lapping, and polishing capabilities, which enable the precise shaping and finishing of semiconductor wafers with superior accuracy and consistency. The unit is equipped with a range of cutting-edge technologies and features that make it a versatile and reliable solution for a wide range of applications in semiconductor manufacturing. The grinding module of SCHNEIDER SLG 301 is specially designed to remove material from semiconductor wafers with exceptional precision and control. The advanced grinding mechanism utilizes high-quality grinding wheels and precise control systems to achieve the desired material removal rate and surface finish. This ensures that the wafers are accurately shaped and prepared for subsequent processing steps, such as lapping and polishing. The lapping module of SLG 301 is optimized to provide a uniform and flat surface on the semiconductor wafers, further enhancing their quality and performance. The lapping process involves the use of abrasive particles suspended in a slurry that is applied to the wafers under controlled pressure and speed. This results in the removal of surface imperfections and the creation of a smooth and uniform surface finish that meets the stringent requirements of semiconductor manufacturing. The polishing module of SCHNEIDER SLG 301 takes the wafer processing to the next level by providing a mirror-like finish on the semiconductor wafers. The polishing process involves the use of specialized polishing pads and slurries that are carefully selected to achieve the desired surface quality and roughness parameters. With precise control over the polishing parameters, the machine ensures that the wafers meet the strict standards for semiconductor device fabrication. One of the key features of SLG 301 is its advanced control tool, which allows operators to easily program and monitor the processing parameters for optimal results. The user-friendly interface provides real-time feedback on key performance metrics, such as material removal rate, surface roughness, and process time, enabling operators to make on-the-fly adjustments as needed to achieve the desired outcomes. In addition to its cutting-edge processing capabilities, SCHNEIDER SLG 301 is also designed for high-throughput operations, allowing semiconductor manufacturers to increase their production capacity and efficiency. The asset is built with robust components and advanced automation features that minimize downtime and maximize uptime, ensuring continuous and reliable operation in demanding manufacturing environments. Overall, SLG 301 sets a new standard for wafer grinding, lapping, and polishing systems in the semiconductor industry, offering unmatched precision, quality, and efficiency for semiconductor fabrication processes. With its advanced technologies and user-friendly interface, this model is poised to revolutionize wafer processing and enable semiconductor manufacturers to stay ahead in a competitive market landscape.
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