Used DNS / DAINIPPON 80A #9162934 for sale

DNS / DAINIPPON 80A is a high performance photoresist equipment designed to provide accurate manufacturing process results in a variety of electronics and microelectronics applications. It is a dry, positive-tone, single-layer process with no need for a wet etch. This system offers the advantage of creating highly repeatable and precise patterns without requiring multiple exposure steps or process steps. DNS 80A unit uses a photosensitive polyimide silicone film that is chemically amplified and patterned using ultra-violet light. The film consists of an aliphatic siloxane base material with various aliphatic and aromatic additives. This film is hydrophobic and insoluble in organic solvents and other liquids. The machine offers excellent resolution, good uniformity, and pattern accuracy. It is designed to be well-suited for use in the production of high-density, fine line components in various semiconductor devices including memory chips, logic devices, communication devices, display devices, and others. DAINIPPON 80A tool is highly efficient in terms of its overall processing times. Its exposure time is exceptionally fast and is also reliable for all pattern sizes. The asset also boasts high-resolution levels so that clearly defined features can be accurately produced. The pattern repeatability of the model is also notable, with allocating reliable process yields and product yield. In terms of templates, the equipment is able to accommodate various pattern templates created using lithography, direct-write or laser-writing technique. Furthermore, the system is designed to be sensitive to all the specified proper image-forming wavelengths. 80A unit is environmentally friendly as it requires no hazardous chemicals for processing. Furthermore, it comes with a relatively low cost of ownership due to its highly efficient process. Additionally, the machine is simple to use and operate. In conclusion, DNS / DAINIPPON 80A photoresist tool is an efficient, accurate and reliable asset for producing highly precise, fine lines and patterned components without using any wet etching or multiple exposure steps. The model offers fast exposure time, high-resolution, and pattern repeatability, high product yield, and is also environmentally friendly. It is an ideal solution for a wide range of electronic and microelectronic applications.