Used ASML 2500/40 #293828002 for sale

Manufacturer
ASML
Model
2500/40
ID: 293828002
Wafer Size: 4"-6"
Steppers, 4"-6" Silicon Carbide (SiC).
ASML 2500/40 Wafer Stepper is a sophisticated semiconductor lithography equipment designed for high-volume production of integrated circuits. It is a dedicated step-and-repeat stepper with extreme precision and efficiency. The system is composed of four major sub-systems: a lithography module, a stage module, a manipulator module, and a digital computer control unit. The lithography module is used to positively transfer data of the resist-coated wafer. It incorporates a projection machine, a photomask, and an illumination source for optimum image transfer. The stage module is composed of a stage base, an X-Y-θ manipulator, and a lens tool. It is used to drive the projection optics for correct and precise image transfer. The manipulator module is used to move the wafer back and forth, providing a fast scanning capability for maximum throughput. The digital control asset consists of a high-speed processor, communications interface, and a software package to provide users with optimal performance and excellent service. It provides the optimal interface between the user and the model. The equipment also has a dual beam capability to ensure maximum reduction in write time and wafer distortion. The advanced features and exceptional accuracy of ASML 2500 / 40 Wafer Stepper make it an ideal choice for organizations needing high-end lithography solutions. This high-performance system enables speeds of up to 175 wafers per hour, providing for maximum throughput. The high-accuracy geometric performance of the unit is ensured by the closed-loop control machine, which provides accurate and repeatable imaging. The high-quality lenses used by 2500/40 feature dynamic focus adjustment, off-axis image transfer, and precise off-axis laser alignment. 2500 / 40 Wafer Stepper is also equipped with a top-end photomask changer, which allows for the rapid exchange of masks without impacting optics performance. This feature eliminates potential wafer print defects caused by lens focus drift. Finally, to ensure easy operation and maintenance, the tool comes with an advanced user interface, diagnostics and restorative capabilities, and an automated calibration routine.
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