Wafer Steppers

Stepper, 12".

Wafer scanners Currently de-installed 2007 vintage.

Wafer stepper.

Steppers, 5".

Stepper, parts machine Body.

i-Line Stepper machine, 6" Reticle: 5" Stored in a cleanroom 1991 vintage.

Stepper, 8", parts system.

Stepper, 4" Reticle, 5".

Stepper, 8" Reticle size: 5" Magnification: 1/5x Image field: 20 mm x 20 mm Numerical aperture: 0.52 ~ 0.60 Uniformity: ~ 3.3% Intensity: 4,750 w/m2 Illumination light source: 1.5 kW Super high pressure Hg lamp Alignment modes: TTL Off-axis He-Ne TV TTL Off-axis broadband TV Alignment light source: He-Ne Laser (633 nm) Broadband (Halogen lamp) Wafer leveling: Die by die tilt Global tilt.

Stepper 1997 vintage.

Scanner, 8" 2001 vintage.

Parts machine without laser or lenses.

Scanner Measurement system 2008 vintage.

Steppers.

Wafer stepper.

Steppers, 6".

Steppers, 4" 2007 vintage.

Stepper, parts machine.

Stepper, 5" Resolution: 0.65㎛ D.O.F: range ≥ 1.5 ㎛ Lens distortion: ≤±0.09 ㎛ Focus stability: ≤0.6 ㎛ Wafer flatness: ≤3 ㎛ Uniformity: ≤±2.0% Reticle rotation accuracy: ±0.02 ㎛ Overlay: |X| + 3σ ≤ 0.2㎛ EGA alignment accuracy: |X| + 3σ ≤ 0.14 ㎛ Stepping accuracy: 3σ ≤ 0.09 ㎛ Pre-alignment repeatability: 3σ ≤ 2 5㎛ Utilities: Electrical power: 200V±20 V, 3 Phase, 50 A, 50/60 Hz Air: ≥3 kg/cm2, 5 L/min, 1/4" Vacuum: ≤300 mmHg, 50 L/min, 1/4" PCW: 16°-32°C, ≥3 kg/c, 18 L/min, 1/2" Thermal exhaust: 1000L/min, 125mm Drain: 1".

Steppers, 4" 1988 vintage.