Wet Stations

Heavy duty benches.

Wet process system, 8".

Wet stations, 8".

Wet process system, 8" Type : CP / H2O2 Install type : Stand-Alone Process flow: L -> R Cassette interface : (2) Tec SEM integrated SMIF (50) Wafer batch loading Robot handler : Hauser Module configuration : Mod 1 (Process) : BSG ƒChem : H2SO4/HF 16:1 ƒTemp : 60°C ƒMaterial type : Quartz tank Mod 2 (Rinse) : QDR (Cold) ƒTemp : Ambient ƒMaterial type : PVDF Mod 3 (Clean) : Gripper clean (GC) ƒMaterial type : PVDF Mod 4 (Process) : PHOS ƒChem : H3PO4 ƒTemp : 155°C ƒER-OX : 40+/-8, PT-OX: 100 ƒER-SIN : 48+/-6, PT-SIN: 60 ƒU%-OX: 20, U%-SIN: 5 Material type : Quartz tank Mod 4 (Rinse) : QDR (Hot) ƒTemp : 50°C ƒMaterial type : PVDF Mod 5 (Rinse) : Final rinse (FR) ƒMegasonic option ƒMaterial type : Quartz tank Mod 6 (Dryer) : DMG ƒMarangoni IPA dry ƒMaterial type : PVDF Mod 6 (Aux) : Auxiliary place Mod 7 (Buffer) : PP Mod 8 (Transfer) : Transfer station Mod 8 (In/Out station) : In/Out ƒUI, CPU, Monitors ƒFire extinguisher system (Control panel) Chemicals: H2SO4 (PFA material) HF (PFA material) H3PO4 (PFA material) HCL (PFA material) IPA (SS material) Drains : Main : PVC, 50A Acid : PVC, 50A Alkali : PVC, 50A Industrial : PVC, 50A Reclaim : PVC, 50A Exhaust : Acid : PVC, 100A (Flange) Alkali : PVC, 100A (Flange) Solvent : PVC, 100A (Flange) Safety interlocks : Leakage sensor Temp Over temp Exhaust Sniffer Ultrasonic dry protect Heat exchanger Door sensors Light barrier Power requirements : 120/208VAC(12kVA), 60A, 3-Phase, 5-wire, Freq 60Hz UPS back-up power : 120/208VAC (8kVA), 23A, 3-Phase, 5-wire, Freq 60Hz 1997 vintage.

Wet station 2004 vintage.

Wet station.

Batch wafer processing, 12" 2004 vintage.

Manual wet bench, 8ft.

Wet stations 2009 vintage.

Wet station Self-contained desiccator (4) Doors Includes: Nitrogen purge tank Airgas NCN NI UPC200, 230 SCF Internal dimensions: 46" x 24" x 34" HEPA Filter Battery, charging system Regulators.

Wet station, 2012 vintage.

Wet station Load CHCL Shower N2 blow DHF Q Etch EDR IPA Dryer Unload.

Systems.

Wet station S/D ONB1 ONB2 ONB3 CSB1 Chlorine CSB2 H2O2 CSB3 HF CSB4 HCL CSB5 HF Aspirator FC Pre tech finesonic generator PT-08M Ultas generator Dual megasonic bath.

Wet station, 12" Single wafer processing Chamber A / B / C / D: Chemical: DHF (1:100) 23° Rinse (Front / Back): DIW / CO2 injection Resistivity: <1MΩ Spin dry: N2 100l / min with shield plate, 3000 RPM 2003 vintage.

Wet benches.

Solvent wet bench Ultrasonic bath with PLC control 12” x 12” Hot plate with PLC control: 8” x 8” (Plate) Tank larger Sink with faucet 16” x 12” 2010 vintage.

Wet station.

Acid wet bench, 8" (6) Foots With (4) tanks (2) QDR.

Megasonic Quartz Bath, 2"x6".