Used ASML AT 1100 #293664232 for sale
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ASML AT 1100 is a high precision wafer stepper and lithography tool designed for today's leading semiconductor manufacturers. It uses advanced technology to pattern minuscule features on semiconductor wafers with a resolution of 0.6 microns. The 4-axis scanner aligns reticles onto the wafer stage and can cover a range of 2" (50.8mm) to 12"(304.8mm). The machine's parallel multi-axis air bearing design allows for precise alignment and motion control of the reticles and wafers. The usage of the short wavelength immersion lithography technique allows for a further reduction of feature sizes. The two-field optical design with a silicon immersion lens has the capability to provide a depth of focus reduction by a factor of 6.This allows features to be patterned even closer together. Additionally, the two-field optical design provides a high numerical aperture of 0.93, which results in a faster cycle time. AT 1100 is a turn-key system that is powered by ASML ACE software. It uses optimal laser source characteristics from Uniformity, Intensity, and Multilayer Energy Uniformity algorithms to achieve optimum UV exposure. It also uses a TML (Time Modulated Laser) system to reduce thermally induced distortions commonly seen in laser illumination. ASML AT 1100 also offers advanced overlay performance and accuracy with its Placement Monitor (PM-1) and wafer stage metrology. The machine has a positional accuracy of 4nm in X/Y, 2 angles, and 5nm in Z to ensure maximum accuracy during exposure. The machine is equipped with an integrated motorized Co-Aligner which provides quick, accurate, and repeatable alignment without the need for manual adjustments. To guarantee the highest reliability and throughput AT 1100 is equipped with an intelligent service module, that can detect minor issues and alert operators. Additionally a comprehensive suite of process monitoring and review tools are integrated to provide maximum control over the process. In conclusion, ASML AT 1100 is a precision wafer stepper designed for semiconductor applications with a resolution of 0.6 microns and advanced features such as the TML system and integrated co-aligner. The machine offers a high level of accuracy and reliability, thanks to its intelligent service module and process monitoring capabilities. AT 1100 is a reliable and capable choice for manufacturing semiconductor wafers.
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