Used ASML AT-1150C #9226883 for sale

ASML AT-1150C is a high-precision wafer stepper designed for the production of smaller semiconductor devices such as MEMS, QFNs, and LED packages. The equipment features a 5.5-inch field of view, which enables imaging of even the most complex structures with high image fidelity. Its 5X reduction optics with high numerical aperture (NA) of 0.60, along with stepper-based diffraction reduction, results in a resolution of 1.3 microns over the entire field of view. The system is grouped into three components: the Optics Unit, the Controller, and the Pattern Generator. The Optics Machine consists of a spatial filter, a stage, an objective lens, an illuminator, and an aligner. The Stage is connected to the Controller and is used to accurately align the sample beneath the objective lens. The Aligner is used to adjust the angular orientation of the objective lens for precise positioning of the imaging tool. The Controller is used to control and manage the overall asset, as well as to store the generated pattern. The Pattern Generator component of the model is based on a laser source and generates high-resolution patterns. It can generate diffraction-limited images with resolutions of 0.5 microns over the entire field of view. This feature, along with 5X reduction imaging and High NA optics, makes it ideal for generating complex structures with high image fidelity. This equipment is highly customizable and can be configured with different options such as multiple lenses, temperature controllers, and various measurement devices. It is also integrated with industry-standard software for mask alignment and pattern generation. The technology used in this system is advanced and extremely reliable. The unit is designed to run non-stop and offers a low maintenance cost. This machine is capable of high yields and produces superior images in a range of formats. In summary, ASML AT 1150C is a world-class wafer stepper tool that is specifically designed to produce highly accurate and high-quality images with the utmost precision. Its advanced optics, high-resolution pattern generator, and various customizable features make it an ideal choice for the production of complex structures.