Used ASML AT-1150C #9412396 for sale

ASML AT-1150C is an advanced exposure tool used for lithography in the semiconductor industry. It is a state-of-the-art wafer stepper that has been designed for high speed, high throughput and low cost of ownership. ASML AT 1150C utilizes advanced optics, a highly stable and accurate inspection equipment, and a unique wafer-handling system for automated, unmanned operation. AT:1150C consists of three major components: an optical unit, an inspection machine, and a wafer-handling tool. The optical asset utilizes a 6.0mm wavelength mercury-in-vapor exposure source, along with a pulse-spray scanning model. This provides a high resolution exposure capability with a precision of 1.5 nm and a image field of 215mm × 215mm. The inspection equipment is based on a Real Time Scan system that utilizes a Quadrant Detector Array with in-pixel detectors. This unit is capable of monitoring every element of the exposure process, with a capability of creating a detailed map of the wafer. Finally, the wafer-handling machine is designed to provide an automated, unmanned operation with a low overall cost of ownership. It utilizes a stainless-steel track that supports up to four wafers and can be preprogrammed with up to 19 user-definable programs. AT-1150C is capable of handling thin films, multilayer films, and all types of wafer substrates, such as quartz, silicon, and metal. Additionally, it is equipped with a layer-to-wafer alignment tool for precise wafer positioning, reducing wafer misalignment during exposure. It is also equipped with an anti-contamination maintenance asset and can handle particles as small as 0.2 µm. Overall, AT 1150C is an advanced exposure tool designed to meet the often strict requirements of the semiconductor industry. Its advanced optical, inspection, and wafer-handling systems make it the ideal choice for high speed, high throughput and low cost of ownership operation.