Used ASML AT 1200 #9360855 for sale

ASML AT 1200
Manufacturer
ASML
Model
AT 1200
ID: 9360855
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ASML AT 1200 is a wafer stepper machine, an optical alignment equipment for lithography used to produce semiconductor integrated circuits (ICs). It uses lenses, mirrors, and other optical components to expose a patterned image onto a silicon wafer. ASML AT-1200 is also capable of producing multiple patterning layers in a single exposure, which speeds up the entire manufacturing process. AT 1200 employs a series of advanced components to ensure accurate, repeatable alignment of the lithography mask patterned on the wafer. It uses two synchronous Servo Drive Scanners with a resolution of 0.1 μm to accurately move the wafer and mask in independent directions. An internal balance system and a three-axis accelerometer are also incorporated to detect and adjust for any imbalances or tilt in the mask position, allowing the unit to make quick corrections without stopping the exposure. AT-1200 uses two optics, a projection lens and a wafer lens, to focus the light from the mask onto the wafer. These lenses allow light from the lithography mask to be projected onto the wafer with a high level of accuracy. Additionally, an advanced light measurement machine is incorporated to adjust for any difference in the power levels emitted by the mask across multiple exposures. ASML AT 1200 wafer stepper is also integrated with light, air, and vacuum systems to ensure optimal alignment and operation of the tool. The light asset provides energy-efficient illumination and includes a photomask that is customized for the layer design of each integrated circuit and an exciter for the wafer lens that adjusts the incident angle of the light for optimal exposure. The air model ensures that the internal environment of the wafer stepper is free from any potentially damaging dust and debris particles. And the vacuum equipment maintains a stable and consistent environment for precise mask alignment within the system. Overall, ASML AT-1200 wafer stepper is an advanced optical alignment unit used by semiconductor IC manufacturers to produce high-quality integrated circuits with repeatable accuracy and efficiency in the shortest amount of time. Its automated components ensure accurate and consistent alignment of the lithography mask, while its integrated light, air and vacuum systems maintain an optimal operating environment.
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