Used ASML AT 1200B #293752358 for sale

ASML 1200B is an advanced wafer stepper that is used in the fabrication of integrated circuits (ICs). It is a photolithographic tool that uses ultraviolet light and photoresists to pattern ICs. ASML 1200B is a wafer-level, step-and-repeat equipment with an improved optical design and a steeper column angle. This allows more light to reach the surface of the wafer, enabling faster throughput and higher throughput yields. The stepper also has a higher accuracy, with a feature size as small as 0.6 microns and an alignment accuracy of less than one micron. ASML 1200B has a versatile alignment system. It can produce line spread functions (LSFs), critical dimension uniformity (CDU), edge placement accuracy (EPA), low particulate levels (LPLs), and other parameters that are required for optimal device performance. The unit also offers adjustable exposure settings and a dummy field monitor (DFM) to enable yield optimization of the IC patterning process. The stepper also offers an automatic focus adjustment feature, enabling the machine to constantly monitor and adjust for the optimum focus. The stepper also features programmable parameters for a range of exposure settings. ASML 1200B can process a variety of photoresists and anti-reflective coatings (ARCs) for optimal lithography patterning. It can handle both positive and negative photoresists for precise optimization of device types. The tool is capable of processing single-die wafers up to 8 inches in diameter. The device also has the capability to process multiple-die wafers up to 12 inches in diameter for faster throughput. In summary, ASML 1200B is an advanced wafer stepper that offers improved throughput, higher device accuracy, programmable parameters, and adjustable exposure settings for an optimized device patterning process. It is capable of handling both single and multiple-die wafers, as well as a range of photoresists and ARC materials, providing excellent performance in the fabrication of integrated circuits.