Used ASML AT-605 #9379125 for sale

ASML AT-605 is a wafer stepper that uses an advanced scanning slit projection alignment equipment to ensure that semiconductor wafers are accurately exposed when lithography is used to define features. The system consists of a 5-stage movable mask, held in place by motorized actuators, and a sophisticated optical unit that illuminates, aligns, and exposes the wafer surface. The machine is designed to provide accurate, fast, and repeatable exposure of the entire semiconductor wafer, within precise tolerance. AT-605 features a precision 95mm x 95mm chrome on quartz mask, with an indexing aperture accuracy of 0.2 micrometers. The projection optical tool delivers a mapping accuracy of 0.4 micrometers, with a holding tolerance of 0.22 micrometers. The asset can achieve a wafer throughput of up to 13 million wafers per hour, making it a very effective and efficient production tool. ASML AT-605 incorporates an image capture model, which enables rapid and precise alignment of the wafer surface. The equipment consists of two CCD cameras, a laser alignment beam, and a projection imaging system. The CCD cameras capture the image of the wafer surface, while the laser alignment beam is used to monitor changes in the wafer's position. This ensures that the wafer is accurately exposed at the correct orientation. The projection imaging unit then maps the exposed image onto the mask. The machine is equipped with a range of features designed to be intuitive and user friendly. These include a graphical user interface, an automated mask centering function, and programmable focus and exposure control. The tool also supports data input, such as material thickness, exposure duration, and exposure index. AT-605 offers the convenience of a single operating asset, with automatic assembly and alignment. The model also provides access to a wide range of lithography models, including up to five at any one time. Finally, ASML AT-605 is highly versatile, as it can be used to process a wide variety of wafer geometries, from square to round and irregular shapes.