Used ASML AT-850C #9281763 for sale

ASML AT-850C is a high-performance wafer stepper, designed to produce semiconductor devices with very fine feature dimensions. It is capable of performing layer to layer print exposures with an ultimate resolution of µm, which is equivalent to 0.25 microns. ASML AT850C utilizes an advanced lithography equipment to produce very fine patterns, making it an ideal choice for semiconductor manufacturing. The system is capable of operating in both a 4-axis step and scan mode, allowing for high throughput and throughput enhancement while offering a reduction in noise levels. The unit is composed of a light source, optical components, a projection lens, and a scanner-based stage. The light source is a high-energy xenon lamp with a peak intensity of 200,000 lux, capable of providing a total intensity range of up to 350,000 lux. The polarization of the light can be adjusted for optimal patterning. The optical components include calibrated reflectors, filters, and optical elements designed for optimal image quality. Additionally, a fly-back camera machine is integrated to autonomously and continuously monitor, amongst others, misalignment, contrast, exposure, and filter status. A dedicated transmission frame-shift mirror tool is used to correct for wafer distortions. The projection lens is a custom-fabrication achromatic lens with a maximum NA of 0.65 and aperture of 10-15mm, providing a highly uniform and efficient transfer of optical energy to the wafer. The projector lens has high precision optics to ensure consistent light power. AT:850C scanner-based stage consists of an advanced closed-loop servo asset to move the mask and wafer in fast scan axis, track both the mask and wafer temperature, and monitor mask and wafer vibrations. A specially designed high precision XY table is used to stage the mask and wafer in both the X- and Y-axes with an accuracy of 10µm. ASML AT 850C is designed to support the most advanced lithography processes demanded by the semiconductor industry. It combines high throughput and accuracy with maximum productivity, resulting in maximum process efficiency for high-end device manufacturers.