Used ASML AT400S #293621264 for sale
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ID: 293621264
Wafer Size: 12"
Vintage: 2001
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With TEL / TOKYO ELECTRON Clean Track ACT 12
Wavelength: 365nm.
ASML AT400S Wafer Stepper is a photolithography tool used for the fabrication and transfer of patterns onto a semiconductive substrate. This stepper has many features that make it an important part of the photolithography process. AT400S features an adjustable spot size that allows for high resolution imaging and improved overlay accuracy. The step-and-repeat capability of the machine allows for multiple exposures on the same wafer, thus enabling multiple different designs to be produced simultaneously. ASML AT400S also features an automated wafer alignment equipment that allows for more accurate placement of the wafer onto the stepper, which results in a more precise patterning of the substrate. Additionally, the stepper is capable of high speed exposure, with a cycle time of less than 5 minutes, providing the operator with a quick turnaround time. In terms of safety, AT400S is designed with an enclosed alignment and exposure area, furthering the safety of the users as well as protecting the machine from particulate contamination. The machine also has an evacuation feature that pulls away any particles or pollutants generated during the photolithography process and throws them away via a mechanical device. The imaging system of ASML AT400S is made up of two components: an optics lens combination and a "white light" source. This combination allows for clear images of the patterns, with a resolution up to 0.05 micrometers and a numerical aperture of 0.75. The "white light" source is a powerful light source unique to AT400S, ensuring that the images are as clear and precise as possible, furthering the efficiency and accuracy of the lithography process. ASML AT400S is also one of the most advanced and reliable photolithography tools available. The machine has a built-in measurement unit for monitoring and controlling the exposure process, as well as a laser wafer centering machine that allows for automated centering of the wafer on the substrate. With these capabilities AT400S has the potential to provide extremely accurate patterns, thus greatly increasing the performance and precision of the lithography process. Overall, ASML AT400S Wafer Stepper is an ideal tool for the fabrication and transfer of patterns onto substrates. Its adjustable spot size, automated wafer alignment tool, and high speed exposure capabilities provide the user with a range of options for varying photolithography processes and makes it an important part of the lithography process.
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