Used ASML C-QUAD #9070539 for sale

ASML C-QUAD is a wafer stepper used in semiconductor lithography. It is a critical tool used across the semiconductor fabrication industry as it enables semiconductor chips to be patterned at extremely fine resolution. C-QUAD features advanced optical technology, firmware and software, and a suite of specialized customizable components. ASML C-QUAD can expose layers of photoresist with great accuracy using a Stepper Alignment Equipment (SAS). The stepper alignment system contrasts pattern alignment sites, called fiducials, between the reticle and the wafer to ensure precise alignment for every exposure. Additionally, an advanced optical design ensures that the imaging qualities of each exposure remain high. Within the wafer stepper itself, a number of key components are included. A laser interferometer unit is included to maintain positioning accuracy, and the stepper hardware has sensors to detect motion and temperature for operating conditions. C-QUAD also has a large capacity autofocus machine and an optimized reticle library. The reticle library stores high resolution information of planned patterns that are used for exposure. ASML C-QUAD is capable of storing and switching between many reticles, enabling different patterns to be exposed without having to replace a reticle. To ensure optimal performance, C-QUAD includes specialized software. A number of protocols are used to ensure precise operation throughout the stepper. These protocols range from data access to pre-exposure calibration and alignment. Additionally, the software includes communication protocols to ensure data synchronization with the reticle library and other external data sources. ASML C-QUAD's advanced features make it an ideal choice for many semiconductor fabrication facilities. It is a reliable solution for producing high quality semiconductor chips at very fine resolutions. With its wide range of customizable components and advanced software and hardware, C-QUAD provides excellent accuracy and performance.