Used ASML NXT 1950Ai #9280821 for sale
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ID: 9280821
Wafer Size: 12"
Vintage: 2012
ARF Scanner, 12"
Process: Lithography
CIM: SECS, GEM Inform pro
Hardware configuration: (Fab)
Main system
FOUP
Options:
ART RH Interface
IRL XP
TOP RC 1 & 2
Aux exhaust unit
CYMER Laser
Flex ray
Base liner focus / OL / HOPC
Smash XY
Agile 1
Spotless
Aux load port
Focus improvement package
PEP High dose
Hardware configuration: (Sub fab / Auxiliary units)
CYMER XLR 660 Laser
2012 vintage.
ASML NXT 1950Ai is a state-of-the-art wafer stepper from ASML, one of the leading innovators in semiconductor manufacturing technology. This equipment is the latest addition to ASML NXT series of products, featuring unmatched precision, versatility and scalability for a wide range of wafer processing needs. NXT 1950Ai is equipped with advanced lithography projection optics, consisting of ultra short-wave, fully stabilized laser components and a four times monochromator. This ensures high accuracy and repeatability for highly complex projection patterns which are essential for modern wafer lithography. The projection lens is also equipped with a newly developed aberration correction system for the highest imaging quality available. The machine features a complex motion unit with four axes allowing the stepper to accurately and quickly move around the wafer. This enables precise alignment of the wafer to the projection optics, as well as adjusting the focus of the lens to the wafer surface. ASML NXT 1950Ai is capable of resolving feature sizes down to 65 nano-meters, well within the requirements of most advanced semiconductor wafer production. This is made possible by the high intensity of the laser source which allows for fast beam delivery to the wafer. It also offers extended exposure times when needed for finer lithography features. Additionally, the machine has an automated alignment machine allowing for easy and accurate alignment of the wafer. When manufacturing wafers at smaller dimensions, NXT 1950Ai can also be utilized for high-resolution direct write (HRDW) processes. These processes allow for the wafer to be directly written on to aiming to reduce lithographic costs. Finally, ASML NXT 1950Ai is designed for maximum uptime and productivity. It is equipped with a high-capacity cooling tool and advanced vibration isolation for consistent and reliable operation. Furthermore, all components are extremely easy to access and troubleshoot, ensuring minimal time and cost is expended on regular maintenance. In conclusion, NXT 1950Ai is at the cutting edge of wafer stepper technology and stands as a powerful tool for semiconductor production. It offers the highest levels of precision and accuracy for a wide range of wafer lithography processes as well as direct write capabilities for the production of finer-dimension semiconductor devices. Furthermore, its robust design ensures reliable operation and minimal maintenance costs.
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