Used ASML NXT 1950i #9293666 for sale

ASML NXT 1950i
Manufacturer
ASML
Model
NXT 1950i
ID: 9293666
Wafer Size: 12"
Vintage: 2012
Lithography system, 12" 2012 vintage.
ASML NXT 1950i is a wafer stepper, designed for the production of memory chips on wafer substrates. The machine utilizes an advanced multi-zone illumination equipment to precisely project a light source onto the wafer. This allows for improved exposure control within the patterning process. The combination of the unique illumination system with a proprietary step-and-repeat technology, pushing the boundaries of feature resolution, positional accuracy, and throughput, sets NXT 1950i apart in the marketplace. The machine has a small footprint and a modular design, making it simple to set up and maintain. It doesn't require the large overhead of many competing machines, thereby reducing costs and simplifying the workflow. The unit offers a host of software features, such as simulation and graphic user interface (GUI) tools, to maximize productivity. It also features an intuitive automated alignment machine that eliminates the need for manual operator oversight. ASML NXT 1950i has an advanced optical tool, capable of producing extremely high resolution patterns and high throughput. Its superior precision is achieved through the latest projection optics and a unique dual-image asset. Additionally, the machine is equipped with advanced X-Y scanning systems, permitting precise and repeatable alignment exposures, which results in superior focus and performance. NXT 1950i also boasts a suite of auto-leveling technologies to ensure maximum throughput and accuracy throughout the production cycle. Auto-correcting mechanisms within the machine, as well as proprietary, real-time monitor calibration systems help mitigate against any process degradation. These technologies, combined with a powerful 4G darkfield mask model, make the machine highly reliable. ASML NXT 1950i has been designed to run 24/7 with excellent output quality and yield. Its advanced capabilities provide superior process yields and cost savings. As a result, it is suitable for very complex process development in the fields of memory production, photo mask manufacturing, flat panel display fabrication, medical device production, and optical sensors.
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