Used ASML NXT-AI #9304318 for sale
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ASML NXT-AI is a wafer stepper that enables high-precision patterning of semiconductor wafer surfaces. This machine is a stepper, meaning it uses a step-and-repeat process to deposit a resist material to pattern the wafer surface, as opposed to fully scanning each wafer, as is the case with an exposure equipment. The machine consists of four primary components: a substrate delivery system, a laser exposure unit, a post-exposure bake (PEB) machine, and an inspection/cleaning/drying tool. The substrate delivery asset deposits the wafer onto a rotating platter, which is then sent to the optical scanner. The scanner uses energy from the laser to create the pattern onto the wafer surface by exposing the resist material. The PEB model is used to help the pattern form by baking the resist. Once the pattern is created, the inspection equipment is used to inspect the wafer for defects, and the cleaning/drying system is used to wipe down the wafer prior to shipment. The key feature of ASML NXT AI is its dual-stage x-ray projection unit, which enables high-precision nano-patterning. This machine uses an eight-nanometer resolution for an extremely detailed patterned wafer surface. The machine is also equipped with an off-axis source, which improves the accuracy of the patterning by producing more uniformed patterns from edge to edge. Furthermore, the machine is equipped with a self-alignment tool as well as various dosing and placement systems, which helps limit process variability. NXT-AI wafer stepper is designed with a high-speed internal memory and processing capabilities, ensuring high throughput and efficient operation. The machine is VOC-free and is designed to provide high pattern fidelity. It also complies with AEC-Q213 requirements, allowing for dependable on-the-fly adjustments in the event of a processing error. Additionally, the machine is equipped with automated maintenance capabilities, which helps reduce downtime and increase long-term reliability. Overall, NXT AI wafer stepper is an advanced machine capable of delivering high-resolution patterns on semiconductor wafers with high fidelity, precision, and reliability. This machine is designed to provide maximum efficiency and performance for semiconductor manufacturers, and its advanced features enable it to create intricate and high-resolution nano-patterned surfaces.
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