Used ASML PAS 2500 / 10 #9241066 for sale

ASML PAS 2500 / 10 is a wafer stepper designed and produced by semiconductor manufacturing equipment company ASML. It is a relatively advanced machine and uses advanced imaging, patterning, and movement technologies to accurately pattern photoresist on wafers. The machine has two optical placement systems, one that determines wafer positioning and one that locates an alignment field for a microscopic offset of the patterning equipment. Patterning is achieved using a projection system that has a projection unit consisting of a 10 micron laser with a 5-inch triangular mirror. It also has manipulators that are able to move the wafer so that different parts of the wafer can be exposed to the light from the laser. The positioning and alignment systems allow for highly accurate pinpoint placement of the photoresist, with less than 1 micron deviation. The projection machine uses a lithographic lens that allows for a fine exposure resolution of 0.5 micron with an even better resolution possible with special lenses. The tool also employs auto-focus to ensure that the pattern is always in sharp focus. PAS 2500 / 10 is equipped with a wafer chuck mechanism that consists of a thermal chuck which keeps the wafer moving and a frost chuck which holds the wafer in place while it is being patterned. The thermal chuck also gives ASML PAS 2500 / 10 the ability to rapidly switch between different exposure tasks. The wafer stepper also includes a wafer stage that is designed to provide stable and repeatable automated motion control. PAS 2500 / 10 has a total of six axes of motion, with three dedicated to the wafer motion, one to the projection lens, one to the reticle, and one to the wafer stage. It also has a five-point correlation marker that allows for photomask alignment down to within one micron. ASML PAS 2500 / 10 also features an advanced dual-axis manipulator for automated photoresist baking that increases the accuracy of the process and ensures that the photoresist coating is evenly distributed over the wafer. It also has a conveyor asset for easy transfer of the wafer from and to the machine. PAS 2500 / 10 is a highly precise and accurate wafer stepper. With its advanced imaging, patterning, and motion technologies, it brings ASML expertise in semiconductor manufacturing equipment to small, medium, and large-scale production runs. Its motion accuracy guarantees tight tolerances, and its photoresist baking model guarantees controlled and accurate exposure, allowing for highly accurate patterns to be created in a cost effective manner.