Used ASML PAS 2500 / 30 #9043931 for sale
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ID: 9043931
Wafer Size: 5"
Stepper, 5"
Operator training: No
PEP 2 (Color Graphics): No
PEP 1/3/4: Yes
SECS (I/II): No
SECS Job creator: No
Single reticle SMIF: No
Matching manager: No
Extended file system (MEP): No
Focus enhancement package: Yes
Line scan: Yes
Dose control: No
Reticle error correction: No
Throughput enhancement: Yes
Batch status light: Yes
Reticle carrier identification: No
Extended power supply: No
88 um Error detection: No
RICO Verification: No
Chuck spot detection: No
Wafer track interface: Yes
Wafer tilt monitor: No
Mechanical / Electrical / Options:
Interface: SVG 88
Stamp drive type: TEP
Stamp foot type: Clean
Stamp POU filter: No
Cyber: SSSD
Air shower (OEPS): Yes
P-Chuck: MIII
P-Chuck top flat finder: No
Microscope: Fixed
Lamp HG: 450W
Alignment PCBD : 4022.436.24720
Analog PCBD in VME: Yes
HDD: Solid state
TCU: No
HCU: No
Ionizer: No
Box 1: KAY
Box 2: KAY
Box 3: KAY
Box 4: KAY
Box 5: KAY
Software: 8.1.0
Optical performance:
Uniformity: 2.7
Matching X magnification: 252
Matching Y magnification: 191
UDOF @ 0.7 Micron status Q4-2008: 2.7
Astigmatism noticed: No
Focus stability: No.
ASML PAS 2500 / 30 is a wafer stepper, commonly used in the semiconductor industry, for creating integrated circuit patterns on a lithography mask. This particular model of wafer stepper offers an optical field size of 30 x 30 mm and a resolution of 0.39 μm. As a model of stepper, PAS 2500 / 30 utilizes a reticle to pattern the desired image on the wafer by using a high-intensity UV laser light source, which provides a uniform exposure wavelength of 248 nm. ASML PAS 2500 / 30 has a significantly enhanced overlay accuracy of +/-7 nm compared to other stepper models, making it highly versatile and advantageous in a variety of tasks, such as masking, patterning, etching, lithography, and more. It also offers a fast exchange rate of 3 minutes on average. An additional advantage is its multiple wavelength capability which enables the machine to process large semiconductor wafers as well as substrates with varying structures and materials. PAS 2500 / 30 is equipped with world-class safety features, allowing safe operation and protection of personnel, including its laser safety shield and dustproof exhaust system. It also provides high-performance output with a processing speed of up to 18 wafer per hour, significantly increasing productivity and cost efficiency. The wafer stepper is supported by built-in diagnostics and feedback systems, tracking different aspects such as production progress, temperature, humidity and vibration levels, for quick identification of potential issues or errors in production and fast and efficient reaction times. To summarize, ASML PAS 2500 / 30 is a sophisticated wafer stepper designed specifically for usage in the semiconductor industry, suitable for efficient processing of large substrates and materials, with various safety and maintenance features, all in one highly reliable and cost-effective package.
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