Used ASML PAS 2500 / 30 #9043931 for sale

ASML PAS 2500 / 30
Manufacturer
ASML
Model
PAS 2500 / 30
ID: 9043931
Wafer Size: 5"
Stepper, 5" Operator training: No PEP 2 (Color Graphics): No PEP 1/3/4: Yes SECS (I/II): No SECS Job creator: No Single reticle SMIF: No Matching manager: No Extended file system (MEP): No Focus enhancement package: Yes Line scan: Yes Dose control: No Reticle error correction: No Throughput enhancement: Yes Batch status light: Yes Reticle carrier identification: No Extended power supply: No 88 um Error detection: No RICO Verification: No Chuck spot detection: No Wafer track interface: Yes Wafer tilt monitor: No Mechanical / Electrical / Options: Interface: SVG 88 Stamp drive type: TEP Stamp foot type: Clean Stamp POU filter: No Cyber: SSSD Air shower (OEPS): Yes P-Chuck: MIII P-Chuck top flat finder: No Microscope: Fixed Lamp HG: 450W Alignment PCBD : 4022.436.24720 Analog PCBD in VME: Yes HDD: Solid state TCU: No HCU: No Ionizer: No Box 1: KAY Box 2: KAY Box 3: KAY Box 4: KAY Box 5: KAY Software: 8.1.0 Optical performance: Uniformity: 2.7 Matching X magnification: 252 Matching Y magnification: 191 UDOF @ 0.7 Micron status Q4-2008: 2.7 Astigmatism noticed: No Focus stability: No.
ASML PAS 2500 / 30 is a wafer stepper, commonly used in the semiconductor industry, for creating integrated circuit patterns on a lithography mask. This particular model of wafer stepper offers an optical field size of 30 x 30 mm and a resolution of 0.39 μm. As a model of stepper, PAS 2500 / 30 utilizes a reticle to pattern the desired image on the wafer by using a high-intensity UV laser light source, which provides a uniform exposure wavelength of 248 nm. ASML PAS 2500 / 30 has a significantly enhanced overlay accuracy of +/-7 nm compared to other stepper models, making it highly versatile and advantageous in a variety of tasks, such as masking, patterning, etching, lithography, and more. It also offers a fast exchange rate of 3 minutes on average. An additional advantage is its multiple wavelength capability which enables the machine to process large semiconductor wafers as well as substrates with varying structures and materials. PAS 2500 / 30 is equipped with world-class safety features, allowing safe operation and protection of personnel, including its laser safety shield and dustproof exhaust system. It also provides high-performance output with a processing speed of up to 18 wafer per hour, significantly increasing productivity and cost efficiency. The wafer stepper is supported by built-in diagnostics and feedback systems, tracking different aspects such as production progress, temperature, humidity and vibration levels, for quick identification of potential issues or errors in production and fast and efficient reaction times. To summarize, ASML PAS 2500 / 30 is a sophisticated wafer stepper designed specifically for usage in the semiconductor industry, suitable for efficient processing of large substrates and materials, with various safety and maintenance features, all in one highly reliable and cost-effective package.
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