Used ASML PAS 2500 / 30 #9234701 for sale

ASML PAS 2500 / 30 is a state-of-the-art wafer stepper designed specifically for the demands of modern semiconductor industry. This series of stepper offers flexible lithography options forMaskless Lithography, Optical Pattern Recognition, and pattern overlay. PAS 2500 / 30 is powered by industry-leading technologies and designed for high yields and low cost-of-ownership. ASML PAS 2500 / 30 achieves superior imaging performance with its proprietary Quad-VFD HSIS Optics and unique Veeco illumination design. This stepper delivers superior imaging output and extended depth of focus with its high-power infrared laser for optimized uniformity and resolution. The Quad-VFD HSIS optics also provides for high-efficiency, high-accuracy design optimization, and supports advanced pattern search applications. The Veeco illumination design ensures excellent imaging efficiency, minimizing pattern interference, and providing fast processing speeds. PAS 2500 / 30 also allows for Pattern Overlay capabilities, which enables precise measurement and alignment of multiple layers for advanced lithography production. This stepper's advanced hardware and software provide for enhanced repeatability and accuracy in complex lithography applications. It also provides alignment accuracy of up to +/- 1um along the x- and y-axes, and up to +/- 0.5um along the z-axis on a 6-inch wafer. For automated lithography production, ASML PAS 2500 / 30 offers Maskless Lithography and Optical Pattern Recognition capabilities. Maskless lithography enables automatic generation of high-quality wafer patterns and complex shapes without the use of masks or masters, reducing overall production costs. Its integrated Optical Pattern Recognition feature provides highly accurate pattern recognition and automatic wafer stitching for fast turnaround times. PAS 2500 / 30 is an ideal choice for modern, high-tech lithography applications that require precision accuracy. It provides advanced imaging performance, precise overlay capabilities, and cutting-edge maskless lithography and OPR features for improved wafer production.