Used ASML PAS 2500 / 30 #9356985 for sale

ASML PAS 2500 / 30 is a personal-sized high resolution CD-stepper designed for a wide range of wafer processing applications. It is a powerful solution for fabrication applications at submicrometer feature sizes and provides superior process control, high throughput, and ultra-clean operation. The stepper combines the advantages of electron beam lithography with the flexibility and compatibility of a compact platform, making it the perfect choice for semiconductor fabrication. PAS 2500 / 30's 200mm wafer platform offers the highest resolution wafer processing available, surpassing other integrated lithography systems. ASML PAS 2500 / 30 features state-of-the-art parameter control using advanced algorithms, allowing optimization of submicron overlay across the entire field. The wafer stepper employs a diffractive optical element in conjunction with a beam-forming mirror to ensure repeatable overlay at a wide range of working distances. PAS 2500 / 30 offers an extremely clean environment, with a design that reduces electrostatic discharge conditions. This combination eliminates splattering of photoresist onto wafers and allows for the processing of sensitive materials with unparalleled process latitude. The total integrated environment includes an accurate 2-axis programmable alignment system, PC-controlled temperatures, and conformal conformal coating system. ASML PAS 2500 / 30 is designed with modularity in mind, allowing users to expand or modify the system's configuration to meet their fabrication needs. It also includes a full suite of integrated metrology and inspection tools with intuitive graphical interfaces for easy setup and optimum control. The wafer stepper is designed with a scalable cooling solution, allowing for further performance enhancement as production needs increase. All these features make PAS 2500 / 30 the smart choice for advanced wafer processing applications.