Used ASML PAS 2500 / 40 #138919 for sale

Name: ASML PAS 2500 / 40
Brand: ASML
SKU: 138919
Availability: InStock

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Wafer Steppers

Manufacturer

ASML

Model

PAS 2500 / 40

ID: 138919

Wafer Size: 5"

Stepper, 5" Operator training: No PEP 2 (Color graphics): Yes PEP 1/3/4: No SECS (I/II): No SECS Job creator: No Single reticle SMIF: No Matching manager: No Extended file system (MEP): No Focus enhancement package: No Line scan: No Dose control: No Reticle error correction: No Throughput enhancement: No Batch status light: No Reticle carrier identification: No Extended power supply: No 88 um error detection: No RICO Verification: No Chuck spot detection: No Wafer track interface: Yes Wafer tilt monitor: Yes Mechanical / electrical / options: Interface: SVG 88 Stamp drive type: Non Stamp foot type: Clean Stamp POU filter: Yes Cyber: SSSD Air shower (OEPS): No P-Chuck: MIII P-Chuck top flat finder: No Microscope: Adjustable Lamp HG: 450W Alignment PCBD: 4022.430.00900 Analog PCBD in VME: MIOS1 HDD: Solid state TCU: No HCU: No Ionizer: No Box 1: FESTO Box 2: FESTO Box 3: FESTO Box 4: FESTO Box 5: FESTO Software: 8.1.0 Optical performance: Uniformity: 2.5 Matching X magnification: 168 Matching Y magnification: 176 UDOF @ 0.7 micron status Q4-2008: 2.4 Astigmatism noticed: No Focus stability: Yes Currently de-installed.

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ASML PAS 2500 / 40 is a high-end wafer stepper designed for high-precision lithography applications. The equipment is capable of producing photomasks for integrated circuit (IC) fabrication with an accurate minimum line width of 0.35 microns. It also offers high throughput with a maximum field size of up to 254 mm. The system is driven by a two-axis mechanical stage, enabling highly precise movement of the 16" or 24" wafer. It features a patented focus control unit, which accurately maintains a uniform focus and field size throughout the entire viewing area. The machine also features an in-vacuum projection tool, which results in greater resolutions and reduced image aberrations. Light for the asset is generated using a krypton fluoride (KrF) excimer laser source. The laser source is capable of producing a wavelength of 248nm, with a pulse repetition frequency of up to 60Hz, and an energy output of up to 100mJ/pulse. This enables the model to accurately and precisely expose even the smallest of patterns without damaging them. The equipment also provides low operating temperature and high thermal stability as designed for sensitive applications. Its in-vacuum projection chamber ensures high temperature stability, maintaining the wafer temperature within ±0.3°C. For user control and calibration, the system provides a web-based computer user interface. This allows users to easily input design data, adjust pattern layouts, adjust settings, download data, and check unit status. It also includes multiple remote operation capabilities such as view control, wafer mapping, and spotting control. In conclusion, ASML PAS 2500/40 is capable of producing ICs with a minimum line width of 0.35 microns, a maximum field size of 254 mm, and an in-vacuum projection machine that ensures high temperature stability. Its KrF excimer laser offers a wavelength of 248nm and high energy output of up to 100mJ/pulse, ensuring high-precise exposures without damaging the patterns. The tool also provides a web-based computer user interface for easy operation and remote control of multiple parameters. PAS 2500 / 40 is ideal for high-precision lithography applications.