Used ASML PAS 2500 / 40 #9234700 for sale

ASML PAS 2500 / 40 is a wafer stepper that is used to precisely pattern thin layers of photoresist on a semiconductor wafer. The machine is capable of achieving an accuracy of +/- 15nm and a lateral resolution of 5nm, making it ideal for cutting-edge lithography applications. ASML PAS 2500/40 utilizes a highly automated proprietary illumination equipment and advanced optics to generate its patterns. The system features a projection-style illuminator which uses a broadband, high-power light source combined with a high-NA lens to accurately deliver a coherent light beam to the wafer. The beam is directed through a beam splitter and optics to precisely pattern the wafer. The machine also features ASML highly effective Advancedzoom mode, which optimizes the illumination field over the exposure area. This ensures that the light exposure is uniform and appropriate for the photoresist layer of the wafer. It also helps to improve accuracy, repeatability and productivity, as image uniformity is maximized regardless of substrate size. In order to ensure accurate lithography results, PAS 2500 / 40 also features advanced alignment and calibration capabilities. The unit utilizes advanced wafer alignment, shot-to-shot registration and a digital exposure process control machine. Together, these features are designed to ensure that each pattern is accurately created and that wafers can be easily transferred from one exposure station to another. The tool provides the flexibility to expose a wide variety of substrates with a range of exposure conditions and exposure resolution. In addition, PAS 2500/40 has the ability to switch quickly between exposures and feature sizes, ensuring efficient processing and rapid process turnaround. ASML PAS 2500 / 40 is also capable of exposure dose control, which ensures that the exposure dose delivered to the wafer is appropriate and consistent. This increases the accuracy of the exposure process, reduces the need for rework, and improves tool availability. In addition, the machine includes an automated data collection asset and secure data storage, allowing users to access data on wafer exposure and integrity. In summary, ASML PAS 2500/40 is an advanced wafer stepper that combines precision and accuracy to deliver a high-value lithography solution. Its features make it particularly suitable for manufacturing tasks in the semiconductor industry and other industries that require precise exposure and alignment.